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Volumn 47, Issue 3 PART 1, 2000, Pages 580-586

New experimental evidence of latent interface-trap buildup in power vdmosfets

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; GAMMA RAYS; INTERFACES (MATERIALS); IRRADIATION; MATHEMATICAL MODELS; RADIATION DAMAGE; THERMAL EFFECTS;

EID: 0034205118     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.856483     Document Type: Article
Times cited : (8)

References (27)
  • 1
    • 33747376854 scopus 로고    scopus 로고
    • T.P, Ma and P.V. Dressendorfer (Eds.), Ionizing Radiation Effects in MOS Devices and Circuits, New York: Wiley, 1989.
    • T.P, Ma and P.V. Dressendorfer (Eds.), Ionizing Radiation Effects in MOS Devices and Circuits, New York: Wiley, 1989.
  • 4
    • 33747312283 scopus 로고    scopus 로고
    • Time dependence of radiation-induced interface trap formation in metaloxide-semiconductor devices as a function of oxide thickness and applied field
    • D.B. Brown and N.S, SaksTime dependence of radiation-induced interface trap formation in metaloxide-semiconductor devices as a function of oxide thickness and applied fieldJ, Appl. Phys., vol. 70, pp. 3734-3747, 1991, and the references therein.
    • J, Appl. Phys., Vol. 70, Pp. 3734-3747, 1991, and the References Therein.
    • Brown, D.B.1    Saks, N.S.2
  • 5
    • 0032027260 scopus 로고    scopus 로고
    • Modeling of kinetics of creation and passivation of interface traps in metal-oxide-semiconductor transistors during postirradiation annealing
    • O.S. Ristic, M.M. Pejovic, and A.B. JaksicModeling of kinetics of creation and passivation of interface traps in metal-oxide-semiconductor transistors during postirradiation annealingJ. Appl. Phys., vol. 83, pp. 29943000, 1998.
    • J. Appl. Phys., Vol. 83, Pp. 29943000, 1998.
    • Ristic, O.S.1    Pejovic, M.M.2    Jaksic, A.B.3
  • 9
    • 0030737028 scopus 로고    scopus 로고
    • Formation and passivation of interface traps in irradiated n-channel power VDMOSFETs during thermal annealing
    • M. Pejovic, G. Ristic, and A. JaksicFormation and passivation of interface traps in irradiated n-channel power VDMOSFETs during thermal annealingAppl. Surf.Sci.,vQ\. 108, pp. 141-148, 1997.
    • Appl. Surf.Sci.,vQ\. 108, Pp. 141-148, 1997.
    • Pejovic, M.1    Ristic, G.2    Jaksic, A.3
  • 10
    • 0031140974 scopus 로고    scopus 로고
    • Creation and passivation of interface raps in irradiated MOS transistors during annealing at different temperatures
    • M.Pejovic and G.RisticCreation and passivation of interface (raps in irradiated MOS transistors during annealing at different temperaturesSolid-St. Electron., vol. 41, pp. 715-720, 1997.
    • Solid-St. Electron., Vol. 41, Pp. 715-720, 1997.
    • Pejovic1    Ristic2
  • 11
    • 33747334866 scopus 로고    scopus 로고
    • O.S. Ristic, Ph.D. Thesis, University of Nis, 1998.
    • O.S. Ristic, Ph.D. Thesis, University of Nis, 1998.
  • 12
    • 0022600166 scopus 로고    scopus 로고
    • Simple technique for separating the effects of interface traps and trappedoxide charge in metal-oxide-semiconductor transistors
    • P.J. McWhorter and P.S. WinokurSimple technique for separating the effects of interface traps and trappedoxide charge in metal-oxide-semiconductor transistorsAppl. Phys. Lett., vol. 48, pp. 133-135, 1986.
    • Appl. Phys. Lett., Vol. 48, Pp. 133-135, 1986.
    • McWhorter, P.J.1    Winokur, P.S.2
  • 15
    • 0041466223 scopus 로고    scopus 로고
    • Analysis of post-irradiation annealing of n-channel power vertical double-diffused metal-oxide-semiconductor transistors to appear in
    • G,S. Ristic, M.M, Pejovic, and A.B. JaksicAnalysis of post-irradiation annealing of n-channel power vertical double-diffused metal-oxide-semiconductor transistors to appear in J. Appl. Phys, April 2000.
    • J. Appl. Phys, April 2000.
    • Ristic, G.S.1    Pejovic, M.M.2    Jaksic, A.B.3
  • 16
    • 21544471157 scopus 로고    scopus 로고
    • Post-irradiation cracking of H2 and formation of interface states in irradiated metal-oxide-semiconductor field-effect transistors
    • R.E. Stahlbush, A.H. Edwards, D.L. Griscom, and B.J. MrstikPost-irradiation cracking of H2 and formation of interface states in irradiated metal-oxide-semiconductor field-effect transistors, J. Appl Phys, vol. 73, pp, 658667, 1993,
    • J. Appl Phys, Vol. 73, Pp, 658667, 1993
    • Stahlbush, R.E.1    Edwards, A.H.2    Griscom, D.L.3    Mrstik, B.J.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.