Cross-sectional nano-spreading resistance profiling

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 355-361

  De Wolf, P ^a   Clarysse, T ^a   Vandervorst, W ^a   Hellemans, L ^b   Niedermann, Ph ^c   Hanni W ^c  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c CSEM   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11644297576     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589810     Document Type: Article

References (15)

1. E. T. Yu, K. Barmak, P. Ronsheim, M. B. Johnson, P. McFarland, and J.-M. Halbout, J. Appl. Phys. 79, 2115 (1996).
2. Y. Huang, C. C. Williams, and M. A. Wendman, J. Vac. Sci. Technol. A 14, 1168 (1996).
3. J. N. Nxumalo, D. T. Shimizu, and D. J. Thomson, J. Vac. Sci. Technol. B 14, 386 (1996).
4. P. De Wolf, T. Clarysse, W. Vandervorst, J. Snauwaert, and L. Hellemans, J. Vac. Sci. Technol. B 14, 380 (1996).
5. M. Barrett, M. Dennis, D. Tiffin, Y. Li, and C. K. Shih, J. Vac. Sci. Technol. B 14, 447 (1996).
6. J. A. Dagata and J. J. Kopanski, Solid State Technol. 38, 91 (1995).
7. A. C. Diebold, M. Kump, J. J. Kopanski, and D. G. Seiler, J. Vac. Sci. Technol. B 14, 196 (1996).
8. P. De Wolf, T. Clarysse, and W. Vandervorst, J. Vac. Sci. Technol. B, these proceedings.
9. Ph. Niedermann, W. Hänni, N. Blanc, R. Cristoph, and J. Burger, J. Vac. Sci. Technol. A 14, 1233 (1996).
10. S. S. Sheiko, M. Möller, E. Reuvekamp, and H. W. Zandbergen, Phys. Rev. B 48, 5675 (1993).
11. T. Clarysse, M. Caymax, P. De Wolf, T. Trenkler, W. Vandervorst, J. S. McMurray, J. Kim, C. C. Williams, J. G. Clark, and G. Neubauer, J. Vac. Sci. Technol. B, these proceedings.
12. B. Wolf and P. Paufler, Cryst. Res. Technol. 31, 505 (1996).
13. U. Dürig, IBM Zürich, Switzerland (private communication).
14. Nanoscope III, Digital Instruments, Santa Barbara, CA.
15. M. Kump and A. Diebold, 1D/2D Dopant Metrology Round Robin Comparison Report, Ver. 1.0 Sematech, 1995.