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Materials Chemistry and Physics

Volumn 57, Issue 1, 1998, Pages 1-16

Microcavity engineering by plasma immersion ion implantation

(2) Chu, Paul K a Cheung, Nathan W b

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

b UNIVERSITY OF CALIFORNIA (United States)

Author keywords

Ion implantation; Plasma; Silicon

Indexed keywords

ION IMPLANTATION; PLASMA APPLICATIONS; SILICON ON INSULATOR TECHNOLOGY;

MICROCAVITY FORMATION;

SILICON WAFERS;

EID: 0032208013 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/S0254-0584(98)00211-9 Document Type: Article

Times cited : (23)

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