Separation of plasma implantation of oxygen to form silicon on insulator

Applied Physics Letters

Volumn 70, Issue 13, 1997, Pages 1748-1750

  Lu, Xiang ^a   Iyer, Sundar Kumar ^a   Liu, Jingbao ^a   Hu, Chenming ^a   Cheung, Nathan W ^a   Min, Jing ^b   Chu, Paul K ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001564114     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118645     Document Type: Article

References (10)

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10. S. S. K. Iyer, X. Lu, J. Min, Z. Fan, J. Liu, B. Linder, P. Chu, C. Hu, and N. W. Cheung, 1996 IEEE International Ion Implantation Technology Conference Proceedings (unpublished).