Transfer of structured and patterned thin silicon films using the Smart-cut® process

Electronics Letters

Volumn 32, Issue 21, 1996, Pages 1985-1986

  Aspar, B ^a   Bruel, M ^a   Zussy, M ^a   Cartier, A M ^a  

^a CEA LETI   (France)

Author keywords

Integrated circuit technology; Silicon on insulator; Thin film devices

Indexed keywords

ATOMIC FORCE MICROSCOPY; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; HYDROGEN BONDS; INTEGRATED CIRCUITS; ION IMPLANTATION; POLISHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; THIN FILM DEVICES;

CHEMICAL MECHANICAL POLISHING; SMART CUT PROCESS; STACKED STRUCTURE;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0030260073     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19961305     Document Type: Article

References (5)

1. BRUEL, M.: 'Silicon on insulator material technology', Electron. Lett., 1995, 31, (14), pp. 1201-1202
2. AUBERTON-HERVÉ, A.J., LAMURE, J.M., BARGE, T., BRUEL, M., ASPAR, B., and PELLOIE, J.L.: 'SOI materials for ULSI applications', Semicond. Int., 1995, 11, pp. 97-104
3. DI CIOCIO, L., LE TIEC, Y., LETERTRE, F., JAUSSAUD, C., and BRUEL, M.: 'Silicon carbide on insulator formation using the Smart-cut process', Electron. Lett., 1996, 32, (12), pp. 1144-1145
4. ZIEGLER, J., BIERSACK, J.P., and LITTMARK, U. in ZIEGLER, J. (Ed.): 'The stoppping and range of ions in solids' (Pergamon, New York)
5. MALEVILLE, C., ASPAR, B., POUMEYROL, T., MORICEAU, H., BRUEL, M., AUBERTON-HERVÉ, A.J., BARGE, T., and METRAL, F.: 'Physical phenomena involved in the Smart-cut process'. Proc. of SiliconOn-Insulator Technology and Devices, The Electrochem. Soc. Series, 1996, 96-3, pp. 34-46