Separation by plasma implantation of oxygen (SPIMOX) operational phase space

IEEE Transactions on Plasma Science

Volumn 25, Issue 5, 1997, Pages 1128-1135

  Sundar Kumar, S ^a   Lu, Xiang ^a   Liu, Jingbao ^a   Min, Jing ^a   Fan, Zhineng ^a   Chu, Paul K ^a   Hu, Chenming ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

PHI; Plasma processing; Silicon on insulator; SIMOX; SOI; SPIMOX

Indexed keywords

ELECTRIC INSULATORS; ION IMPLANTATION; IONIZATION; OXYGEN; PHASE SPACE METHODS; SILICON ON INSULATOR TECHNOLOGY;

SEPARATION BY PLASMA IMPLANTATION OF OXYGEN (SPIMOX);

PLASMA APPLICATIONS;

EID: 0031246533     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.649635     Document Type: Article

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