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Materials Chemistry and Physics

Volumn 46, Issue 2-3, 1996, Pages 132-139

Plasma immersion ion implantation for semiconductor processing

(1) Cheung, N W a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

Ion implantation; Plasma immersion ion implantation; Shallow junctions; SIMOX

Indexed keywords

PLASMA APPLICATIONS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; SURFACE TREATMENT;

ION MASS SELECTION; MICROCAVITY ENGINEERING; PLASMA IMMERSION ION IMPLANTATION; SEPARATION BY OXYGEN IMPLANTATION; SHALLOW JUNCTIONS;

ION IMPLANTATION;

EID: 0030284591 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/S0254-0584(97)80006-5 Document Type: Article

Times cited : (56)

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