Low-k1 optical lithography for 100 nm logic technology and beyond

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2329-2334

  Yen, Anthony ^a   Yu, Shinn Sheng ^a   Chen, Jeng Horng ^a   Chen, Chun Kuang ^a   Gau, Tsai Sheng ^a   Lin, Burn Jeng ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; EIGENVALUES AND EIGENFUNCTIONS; MASKS; MATHEMATICAL MODELS; MATRIX ALGEBRA; PHASE SHIFT;

CRITICAL DIMENSION VARIATION; MASK ERROR FACTOR; OPTICAL PROXIMITY CORRECTION; QUADRUPOLE ILLUMINATION;

PHOTOLITHOGRAPHY;

EID: 0035519771     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1412894     Document Type: Article

References (8)

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