Minimization of mask transmission asymmetry effect for chromeless phase-shift masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 911-920

  Chan, David ^a   Novak, Justin ^a   Fritze, Michael ^b  

^a Photronics Photomasks ^*  (United States)

^b MIT LINCOLN LABORATORY   (United States)

Author keywords

Chromeless; Intensity Asymmetry; Intensity Balance; Phase Shift Mask

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; DIFFRACTION GRATINGS; ETCHING; PHASE SHIFT; PHOTORESISTS;

CHROMELESS PHASE-SHIFT MASKS; PHASE SHIFT GRATINGS;

MASKS;

EID: 0035043064     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410678     Document Type: Article

References (11)