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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 1 A/B, 2002, Pages

Microcrystalline silicon prepared by hot-wire chemical vapour deposition for thin film solar cell applications

(6) Klein, Stefan a Wolff, Johannes a Finger, Friedhelm a Carius, Reinhard a Wagner, Heribert a Stutzmann, Martin a,b

a FORSCHUNGSZENTRUM JÜLICH (Germany)

b WALTER SCHOTTKY INSTITUT (Germany)

Author keywords

Conductivity; Hot wire CVD; Hydrogen content; Infrared absorption; Microcrystalline silicon; Solar cells; Spin density; Substrate temperature

Indexed keywords

CRYSTALLINE MATERIALS; INFRARED SPECTROSCOPY; PARAMAGNETIC RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS; SUBSTRATES; THIN FILMS;

MICROCRYSTALLINE SILICON;

SEMICONDUCTING SILICON;

EID: 0037082078 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.l10 Document Type: Article

Times cited : (32)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.