Stability of microcrystalline silicon for thin film solar cell applications

IEE Proceedings: Circuits, Devices and Systems

Volumn 150, Issue 4, 2003, Pages 300-308

  Finger, F ^a   Carius, R ^a   Dylla, T ^a   Klein, S ^a   Okur, S ^b   Gunes M ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b IZMIR INSTITUTE OF TECHNOLOGY   (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AMORPHOUS SILICON; OXIDATION; SOLAR CELLS;

LIGHT-INDUCED DEGRADATION;

THIN FILMS;

EID: 0142260940     PISSN: 13502409     EISSN: None     Source Type: Journal    
DOI: 10.1049/ip-cds:20030636     Document Type: Conference Paper

References (34)

1. Wang, C., and Lucovsky, G.: 'Intrinsic microcrystalline silicon deposited by remote PECVD: a new thin-film photovoltaic material'. Proc. 21st IEEE Photovoltaic Specialists Conf., Kissikimee, FL, USA, 1990, pp. 1614-1618
2. Faraji, M., Gokhale, S., Choudhari, S.M., Takwale, M.G., and Ghaisas, S.V.: 'High mobility hydrogenated and oxygenated microcrystalline silicon as a photosensitive material in photovoltaic applications', Appl. Phys. Lett., 1992, 60, pp. 3289-3291
3. Meier, J., Flückiger, R., Keppner, H., and Shah, A.: 'Complete microcrystalline p-i-n solar cell-crystalline or amorphous cell behavior?", Appl. Phys. Lett., 1994, 65, pp. 860-862
4. Staebler, D.L., and Wronski, C.R.: 'Reversible conductivity charge in discharge-produced amorphous Si', Appl. Phys. Lett., 1977, 31, pp. 292-294
5. Vetterl, O., Finger, F., Carius, R., Hapke, P., Houben, L., Kluth, O., Lambertz, A., Mück, A., Rech, B., and Wagner, H.: 'Intrinsic microcrystalline silicon: a new material for photovoltaics', Sol. Energy Mater. Sol. Cells, 2000, 62, pp. 97-108
6. Klein, S., Wolff, J., Finger, F., Carius, R., Wagner, H., and Stutzmann, M.: 'Microcrystalline silicon prepared by hot-wire chemical vapour deposition for thin film solar cell applications', Jpn. J. Appl. Phys. 2, Lett., 2002, 41, pp. L10-L12
7. Klein, S., Finger, F., Carius, R., Rech, B., Houben, L., Luysberg, M., and Stutzmann, M.: 'High efficiency thin film solar cells with intrinsic microcrystalline silicon prepared by hot wire CVD', Mater. Res. Soc. Symp. Proc., 2002, 715, p. A26.2
8. Vetterl, O., Carius, R., Houben, L., Scholten, C., Luysberg, M., Lambertz, A., Finger, F., and Wagner, H.: Mater. Res. Soc. Symp. Proc., 2000, 609, p. A15.2
9. Brammer, T., and Stiebig, H.: 'Defect density and recombination lifetime in microcrystalline silicon absorbers of highly efficient thin-film solar cells determined by numerical device simulations', J. Appl. Phys., 2003, 94, p. 1035
10. Luysberg, M., Scholten, C., Houben, L., Carius, R., Finger, F., and Vetterl, O.: 'Structural properties of microcrystalline Si solar cells', Mater. Res. Soc. Symp. Proc., 2001, 664, p. A15.2
11. Houben, L., Scholten, C., Luysberg, M., Vetterl, O., Finger, F., and Carius, R.: 'Growth of microcrystalline nip Si solar cells: role of local epitaxy', J. Non-Cryst. Solids, 2002, 299-302, pp. 1189-1193
12. Klein, S., Finger, F., Carius, R., Dylla, T., Rech, B., Grimm, M., Houben, L., and Stutzmann, M.: 'Intrinsic microcrystalline silicon by hot-wire CVD for thin film solar cells', Thin Solid Films, 2003, 430, p. 202
13. Vepřek, S., Iqpal, Z., Kühne, R.O., Capezzuto, P., Sarott, F.-A., and Gimzewski, J.K.: 'Properties of microcrystalline silicon. IV. Electrical conductivity, electron spin resonance and the effect of gas adsorption', J. Phys. C, Solid State Phys., 1983, 16, pp. 2641-264
14. Vetterl, O., Gross, A., Jana, T., Ray, S., Lambertz, A., Carius, R., and Finger, F.: 'Changes in electric and optical properties of intrinsic microcrystalline silicon upon variation or the structural composition', J. Non-Cryst. Solids., 2002, 299-302, pp. 772-777
15. Finger, F., Klein, S., Dylla, T., Baia Neto, A.L., Vetterl, O., and Carius, R.: 'Defects in microcrystalline silicon prepared with hot wire CVD', Mater. Res. Soc. Symp. Proc., 2002, 715, p. A16.3
16. Brüggemann, R., Hierzenberger, A., Wanka, H.N., and Schubert, M.B.: Mater. Res. Soc. Symp. Proc., 1998, 507, p. 921
17. Kanschat, P., Lips, K., Brüggemann, R., Hierzenberger, A., Sieber, I., and Fuhs, W.: Mater. Res. Soc. Symp. Proc., 1998, 507, p. 793
18. Muck, A., Zastrow, U., Vetterl, O., and Rech, B.: in Benninghoven, A., Bertrand, P., Migeon, H.-N. and Werner, H.W. (Eds.) 'Secondary ion mass spectrometry SIMS XII' (Elsevier Science B.V., Amsterdam, 2000), p. 689
19. Nickel, N., and Rakel, M.: 'Hydrogen-induced metastable changes in the electrical conductivity of microcrystalline silicon', Phys. Rev. B, 2001, 65, pp. 041301/1-4
20. Will, D., Lerner, C., Funs, W., and Lips, K.: 'Transport and recombination channels in undoped microcrystalline silicon studied by ESR and EDMR', Mat. Res. Soc. Symp. Proc., 1997, 467, pp. 361-366
21. Houben, L., Luysberg, M., Hapke, P., Carius, R., Finger, F., and Wagner, H.: 'Structural properties of microcrystalline silicon' in the transition from highly crystalline to amorphous growth', Philos. Mag. A, 1998, 77, pp. 1447-1460
22. Finger, F., Müller, I., Malten, C., and Wagner, H.: 'Electronic states in hydrogenated microcrystalline silicon', Philos. Mag. B, 1998, 77, pp. 805-830
23. Müller, J., Finger, F., Carius, R., and Wagner, H.: 'Electron spin resonance investigation of electronic states in hydrogenated microcrystalline silicon', Phys. Rev. B, 1999, 60, pp. 11666-11677
24. Luysberg, M., Hapke, P., Carius, R., and Finger, F.: 'Structure and growth of hydrogenated microcrystalline silicon; investigation by transmission electron microscopy and Raman spectroscopy of films grown at different plasma excitation frequencies', Philos. Mag. A, 1997, 75, pp. 31-47
25. Ross, C., Herion, J., and Wagner, H.: 'Nucleation and growth analysis of microcrystalline silicon by scanning probe microscopy: substrate dependence, local structural and electronic properties of as-grown surfaces', J. Non-Cryst. Solids, 2000, 266-269, pp. 69-73
26. Vallat-Sauvain, E., Kroll, U., Meier, J., Shah, A., and Pohl, J.: 'Evolution of the microstructure in microcrystalline silicon prepared by very high frequency glow-discharge using hydrogen dilution', J. Appl. Phys., 2000, 87, pp. 3137-3142
27. Rath, J.K.: Sol. Energy Mater. Sol. Cells, 2003, 76, p. 431
28. Collins, R.W., and Yang, B.Y.: 'In situ ellipsometry of thin-film deposition: Implications for amorphous and microcrystalline Si growth', J. Vac. Sci. Technol. B, 1989, 7, pp. 1155-1164
29. Klein, S., Finger, F., Carius, R., Wagner, H., and Stutzmann, M.: 'Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications', Thin Solid Films, 2001, 395, pp. 305-309
30. Kniffler, N., Schröder, B., and Geiger, J.: 'Vibrational spectroscopy of hydrogenated evaporated amorphous silicon films', J. Non-Cryst. Solids, 1983, 58, pp. 153-163
31. Torres, P., Meier, J., Flückiger, R., Kroll, U., Anna Selvan, J.A., Keppner, H., Shah, A., Littlewood, S.D., Kelly, I.E., and Giannoules, P.: 'Device grade microcrystalline silicon owing to reduced oxygen contamination', Appl. Phys. Lett., 1996, 69, pp. 1373-1375
32. Kamei, T., Wada, T., and Matsuda, A.: Mater. Res. Soc. Symp. Proc., 2001, 664, p. A10.1.1
33. Shimura, F. (Ed.): 'Oxygen in silicon' Semiconductors and Semimetals, vol. 42, (Academic Press, San Diego, CA, USA, 1994)
34. Stutzmann, M.: "The defect density in amorphous silicon', Philos. Mag. B, 1989, 60, pp. 531-546