Quantitative sub-surface and non-contact imaging using scanning microwave microscopy

Nanotechnology

Volumn 26, Issue 13, 2015, Pages

  Gramse, Georg ^a   Brinciotti, Enrico ^b   Lucibello, Andrea ^c   Patil, Samadhan B ^d   Kasper, Manuel ^a   Rankl, Christian ^b   Giridharagopal, Rajiv ^e   Hinterdorfer, Peter ^a   Marcelli, Romolo ^c   Kienberger, Ferry ^b  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b KEYSIGHT TECHNOLOGIES   (United States)

^c CNR   (Italy)

^d LONDON CENTRE FOR NANOTECHNOLOGY   (United Kingdom)

^e INTEL CORPORATION   (United States)

Author keywords

Calibration; Capacitance; Complex impedance; Nanotechnology; Scanning microwave microscopy; Sub surface imaging

Indexed keywords

CALIBRATION; CAPACITANCE; FINITE ELEMENT METHOD; MICROWAVES; NANOTECHNOLOGY; SCANNING; SILICON; SILICON OXIDES;

BROADBAND FREQUENCY; COMPLEX IMPEDANCE; DIELECTRIC THIN FILMS; FINITE ELEMENT MODELLING; IMAGING CONDITIONS; SCANNING MICROWAVE MICROSCOPIES; SUB-SURFACE IMAGING; TIP-SAMPLE DISTANCE;

SURFACE MOUNT TECHNOLOGY;

EID: 84925359438     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/26/13/135701     Document Type: Article

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