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Proceedings of the IEEE Conference on Nanotechnology

Volumn , Issue , 2012, Pages

A calibration algorithm for nearfield scanning microwave microscopes

(6) Hoffmann, Johannes a Wollensack, Michael a Zeier, Markus a Niegemann, Jens b Huber, Hans Peter c Kienberger, Ferry d

a RF and Microwave Laboratory of the National Metrology Institute of Switzerland (METAS) (Switzerland)

b ETH ZURICH (Switzerland)

c INSTITUTE FOR MICROELECTRONICS (Austria)

d Agilent Technologies Osterrreich GmbH (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION ALGORITHM; CALIBRATION METHOD; NEAR-FIELD SCANNING MICROWAVE MICROSCOPE; VECTOR NETWORK ANALYZERS;

ALGORITHMS; NANOTECHNOLOGY; POLYCRYSTALLINE MATERIALS;

CALIBRATION;

EID: 84869193828 PISSN: 19449399 EISSN: 19449380 Source Type: Conference Proceeding
DOI: 10.1109/NANO.2012.6322116 Document Type: Conference Paper

Times cited : (35)

References (7)

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2
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- Huber, H.P.¹ Moertelmaier, M.² Wallis, T.M.³ Chiang, C.J.⁴ Hochleitner, M.⁵ Imtiaz, A.⁶ Oh, Y.J.⁷ Schilcher, K.⁸ Dieudonne, M.⁹ Smoliner, J.¹⁰ Hinterdorfer, P.¹¹ Rosner, S.J.¹² Tanbakuchi, H.¹³ Kabos, P.¹⁴ Kienberger, F.¹⁵

3
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- J. Smoliner, H. P. Huber, M. Hochleitner, M. Moertelmaier, and F. Kienberger, "Scanning microwave microscopy/spectroscopy on metal-ox idesemiconductor systems, " Journal of Applied Physics, vol. 108, p. 7, Sep 2010.
- (2010) Journal of Applied Physics , vol.108 , pp. 7
- Smoliner, J.¹ Huber, H.P.² Hochleitner, M.³ Moertelmaier, M.⁴ Kienberger, F.⁵

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- Hoboken, USA: John, Wiley & Sons, Inc.
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