SCOPUS 정보 검색 플랫폼

Volumn 7, Issue 8, 2015, Pages 3558-3564

Highly air stable passivation of graphene based field effect devices

(8) Sagade, Abhay A a Neumaier, Daniel a Schall, Daniel a Otto, Martin a Pesquera, Amaia b Centeno, Alba b Elorza, Amaia Zurutuza b Kurz, Heinrich a

a AMO GMBH (Germany)

b GRAPHENEA (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; PASSIVATION;

AMBIENT CONDITIONS; ATOMIC LAYER DEPOSITED; DC CHARACTERISTICS; DEVICE FABRICATIONS; ENCAPSULATION LAYER; FIELD-EFFECT DEVICES; FUNCTIONAL DEVICES; SURFACE ADSORBATES;

GRAPHENE;

EID: 84923171957 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c4nr07457b Document Type: Article

Times cited : (96)

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