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Volumn 133, Issue , 2015, Pages 16-22

Study on resist performance of chemically amplified molecular resists based on cyclic oligomers

Author keywords

Calixarene derivative; Chemically amplified resist; Extreme ultraviolet; Molecular resist; Noria derivative

Indexed keywords

CYCLODEXTRINS; PHENOLS; PHOTORESISTS;

EID: 84918535273     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2014.11.002     Document Type: Article
Times cited : (21)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.