Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Horne, Stephen F ^a   Besen, Matthew M ^a   Smith, Donald K ^a   Blackborow, Paul A ^a   D'Agostino, Robert ^a  

^a ENERGETIQ TECHNOLOGY INC   (United States)

Author keywords

EUV source; Z Pinch

Indexed keywords

ELECTRODES; EROSION; INDUCTIVELY COUPLED PLASMA; LIGHT MEASUREMENT; LIGHT SOURCES; MELTING; OPTIMIZATION;

CONTAMINATING DEBRIS; EUV SOURCE; SOURCE WALLS; Z-PINCH;

PLASMAS;

EID: 33745628743     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655696     Document Type: Conference Paper

References (9)

1. I. H. Hutchinson et al., "First results from Alcator C-Mod," Physics of Plasmas 1(5), p. 1511, 1994.
2. N. Krall and A. Trivelpiece, Principles of Plasma Physics, McGraw-Hill, New York, 1973.
3. S. Sheshadri, Fundamentals of Plasma Physics, American Elsevier Publishing Company, New York, 1973.
4. E. Gullickson. personal communication.
5. G. Denbeaux, P. Naulleau, R. G. S. Horne, and M. Besen, "First use of the energetiq 10w electrodeless euv plasma source," in 2005 International EUVL Symposium,San Diego, CA, Sematech, 2005. Poster Presentation.
6. L. Shmaenok, "Multilayer-based instrumentation developments for uuvl source metrology." Sematech EUVL Source Workshop, Feb 2003.
7. K. Mielenz, "On the diffraction limit for lensless imaging," J. Res. Natl. Inst. Stand. Technol., 1999.
8. D. Attwood, B. Weistein, and R. Wuerker, "Composite x-ray pinholes for time-resolved microphotography of laser compressed targets," Applied Optics, 1977.
9. A. Keen and C. Hughes, "Euv stimulated photo-resist outgassing," in 2005 International EUVL Symposium,San Diego, CA, Sematech, 2005.