Spectroscopic ellipsometry characterization of amorphous and crystalline TiO 2 thin films grown by atomic layer deposition at different temperatures

Applied Surface Science

Volumn 315, Issue 1, 2014, Pages 116-123

  Saha, D ^a   Ajimsha, R S ^a   Rajiv, K ^a   Mukherjee, C ^a   Gupta, M ^b   Misra, P ^a   Kukreja, L M ^a  

^a RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

^b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

Atomic layer deposition; Columnar growth; Large grained anatase; Spectroscopic ellipsometry

Indexed keywords

AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; ATOMS; CRYSTAL ATOMIC STRUCTURE; CRYSTALLINE MATERIALS; DISPERSION (WAVES); NANOCRYSTALS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; TITANIUM DIOXIDE;

COLUMNAR GROWTH; CRYSTALLINE PHASE TRANSFORMATION; DISPERSION ENERGIES; INTERBAND ABSORPTION; MORPHOLOGICAL CHARACTERISTIC; NANO-CRYSTALLINE FILMS; SINGLE OSCILLATORS; SUBSTRATE TEMPERATURE;

OPTICAL FILMS;

EID: 84912099986     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.07.098     Document Type: Article

References (38)

1. 2 cermet thin films, Thin Solid Films 474 (2005) 245.
2. 2 interlayer, Appl. Phys. Lett. 97 (2010) 112905.
3. 2 films with ultralow leakage currents for next generation DRAM capacitors, Adv. Mater. 20 (2008) 1429.
4. 2 -based transparent conducting oxides: the search for optimum electrical conductivity using a combinatorial approach, J. Mater. Chem. C 1 (2013) 6335.
5. 2 multilayers for applications as bandpass filters and antireflection coatings, Appl. Opt. 48 (2009) 1727.
6. Zhichao Liu, Songlin Chen, Ping Ma, Yaowei Wei, Yi Zheng, Feng Pan, Hao Liu, Gengyu Tang, Characterization of 1064 nm nanosecond laser induced damage on antireflection coatings grown by atomic layer deposition, Opt. Express 20 (2012) 854.
7. Shin-ichi Itsu, Shinji Motokoshi, Takahisa Jitsuno, Masahiro Nakatsuka, Tat-suhiko Yamanaka, Large-area optical coatings with uniform thickness grown by surface chemical reactions for high-power laser applications, Jpn. J. Appl. Phys. 41 (2002) 160.
8. 2 beads with high surface areas and controllable pore sizes: a superior candidate for high-performance dye-sensitized solar cells, Adv. Mater. 21 (2009) 2206.
9. 2 nanofibers by a hydro-thermal method, J. Photochem. Photobiol. A: Chem. 182 (2006) 121.
10. 2 thin films obtained by pulsed laser deposition for gas sensing applications, Appl. Surf. Sci. 247 (2005) 429.
11. 2 thin films, Appl. Surf. Sci. 254 (2007) 148.
12. 2 O: investigation of growth mechanism, Appl. Surf. Sci.172 (2001) 148.
13. 2 O on α-Al2O3 substrates, J. Cryst. Growth 242 (2002) 189.
14. 2 on aerogel templates: new photoanodes for dye-sensitized solar cells, J. Phys. Chem. 112 (2008) 10303.
15. 2 thin films from titanium tetramethoxide and water, Chem. Vap. Deposition 10 (2004) 143.
16. 2 nanotube arrays based dye-sensitized solar cells via ultraprecise control of the nanotube wall thickness, J. Power Sources 240 (2013) 503.
17. Riikka L. Puurunen, Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process, J. Appl. Phys. 97 (2005) 121301.
18. Mikko Ritala, Markku Leskela, Leena-Sisko Johansson, Lauri Niinisto, Atomic force microscopy study of titanium dioxide thin films grown by atomic layer epitaxy, Thin Solid Films 228 (1993) 32.
19. 2 thin films grown by atomic layer deposition, Thin Solid Films 305 (1997) 270.
20. 2 thin films: effects of substrate and annealing temperature, J. Appl. Phys. 88 (2000) 4634.
21. 2 thin films prepared by ion-assisted electron-beam evaporation, Curr. Appl. Phys. 9 (2009) 707.
22. 2 thin films prepared by dc reactive magnetron sputtering: annealing temperature effect, Chin. Phys. Lett. 24 (2007) 1505.
23. H.G. Tompkins, E.A. Irene (Eds.), Handbook of Ellipsometry, Springer-Verlag,2005.
24. x bulkglasses studied by spectroscopic ellipsometry, J. Appl. Phys. 103 (2008) 083512.
25. 2 thin films using spectroscopic ellipsometry, J. Phys.: Conf. Ser. 417 (2013) 012007.
26. 2 from tetrakis-dimethyl-amido titaniumor Ti isopropoxide precursor sand H2O, J. Appl. Phys. 102 (2007) 083521.
27. Michael Grätzel, Photoelectrochemical cells, Nature 414 (2001) 338.
28. J.R. Ares, A. Pascual, I.J. Ferrer, C. SÁnchez, Grain and crystallite size in polycrys-talline pyrite thin films, Thin Solid Films 480 (2005) 477.
29. Hiroyuki Fujiwara, Spectroscopic Ellipsometry Principles and Applications, John Wily & Sons, Ltd, 2007.
30. G.E. Jellison Jr., V.I. Merkulov, A.A. Puretzky, D.B. Geohegan, G. Eres, D.H. Lown-des, J.B. Caughman, Characterization of thin-film amorphous semiconductors using spectroscopic ellipsometry, Thin Solid Films 377 (2000) 68.
31. Angel Yanguas-Gil, Brent A. Sperling, John R. Abelson, Theory of light scattering from self-affine surfaces: relationship between surface morphology and effective medium roughness, Phys. Rev. B 84 (2011) 085402.
32. G.E. Jellison Jr., F.A. Modine, Parameterization of the optical functions of amorphous materials in the interband region, Appl. Phys. Lett. 69 (1996) 371.
33. E. Langereis, S.B.S. Heil, H.C.M. Knoops, W. Keuning, MCMvan de Sanden, W.M.M. Kessels, In situ spectroscopic ellipsometry as a versatile tool for study-ing atomic layer deposition, J. Phys. D: Appl. Phys. 42 (2009) 073001.
34. G. He, L.D. Zhang, G.H. Li, M. Liu, L.Q. Zhu, S.S. Pan, Spectroscopic ellipsometry characterization of nitrogen-incorporated HfO2gate dielectrics grown byradio-frequency reactive sputtering, Appl. Phys. Lett. 86 (2005) 232901.
35. H. Fujiwara, Joohyun Koh, P.I. Rovira, R.W. Collins, Assessment of effective-medium theories in the analysis of nucleation and microscopic surface roughness evolution for semiconductor thin films, Phys. Rev. B 61 (2000) 10832.
36. Joohyun Koh, Lu Yiwei, C.R. Wronski, Yalei Kuang, R.W. Collins, T.T. Tsong, Y.E. Strausser, Correlation of real time spectroellipsometry and atomic force microscopy measurements of surface roughness on amorphous semiconductor thin films, Appl. Phys. Lett. 69 (1996) 1297.
37. S.H. Wemple, M. DiDomenico Jr., Behaviour of the electronic dielectric constant in covalent and ionic materials, Phys. Rev. B 3 (1971) 1338.
38. S.H. Wemple, Refractive-index behaviour of amorphous semiconductors and glasses, Phys. Rev. B 7 (1973) 3767.