A spectroscopic ellipsometry study of TiO2 thin films prepared by dc reactive magnetron sputtering: Annealing temperature effect

Chinese Physics Letters

Volumn 24, Issue 6, 2007, Pages 1505-1508

  Mati, Horprathum ^a   Pongpan, Chindaudom ^b   Pichet, Limsuwan ^a  

^a KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI   (Thailand)

^b NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CURVE FITTING; MAGNETRON SPUTTERING; OXIDE MINERALS; REFRACTIVE INDEX; REGRESSION ANALYSIS; SILICON WAFERS; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

ANNEALED FILMS; ANNEALING TEMPERATURE EFFECTS; ARGON GAS; DC REACTIVE MAGNETRON SPUTTERING; OXYGEN GAS; PHYSICAL MODELLING; SUB-LAYERS; TIO 2 THIN FILM; TITANIA; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

SPECTROSCOPIC ELLIPSOMETRY;

EID: 34249981273     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/24/6/021     Document Type: Article

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