Characterization of 1064nm nanosecond laserinduced damage on antireflection coatings grown by atomic layer deposition

Optics Express

Volumn 20, Issue 2, 2012, Pages 854-863

  Liu, Zhichao ^a   Chen, Songlin ^a   Ma, Ping ^a   Wei, Yaowei ^a   Zheng, Yi ^a   Pan, Feng ^a   Liu, Hao ^a   Tang, Gengyu ^a  

^a CHENGDU FINE OPTICAL ENGINEERING RESEARCH CENTER   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CARBON FILMS; CARBON INORGANIC COMPOUNDS; COATINGS; HAFNIUM OXIDES; TITANIUM DIOXIDE;

ABSORPTION DEFECT; CARBON IMPURITIES; DAMAGE RESISTANCE; DAMAGE TESTS; E BEAM EVAPORATION; HIGHER TEMPERATURES; LASER INDUCED DAMAGE THRESHOLDS; LASER RESISTANCE; LASER-INDUCED DAMAGE; MULTIPLE IRRADIATION; TIO;

ANTIREFLECTION COATINGS;

ALUMINUM OXIDE; HAFNIUM; HAFNIUM OXIDE; OXIDE; TITANIUM; TITANIUM DIOXIDE;

ARTICLE; CHEMISTRY; EQUIPMENT; INSTRUMENTATION; LASER; METHODOLOGY; OPTICS; SURFACE PROPERTY; THEORETICAL MODEL;

ALUMINUM OXIDE; EQUIPMENT FAILURE ANALYSIS; HAFNIUM; LASERS; MODELS, THEORETICAL; OPTICS AND PHOTONICS; OXIDES; SURFACE PROPERTIES; TITANIUM;

EID: 84855952335     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.000854     Document Type: Article

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