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Journal of Crystal Growth

Volumn 242, Issue 1-2, 2002, Pages 189-198

Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates

(6) Aarik, Jaan a Aidla, Aleks a Mändar, Hugo a Uustare, Teet a Schuisky, Mikael b,c Hårsta, Anders b

a UNIVERSITY OF TARTU (Estonia)

b UPPSALA UNIVERSITY (Sweden)

c AB Sandvik Steel (Sweden)

Author keywords

A1. Surface structure; A3. Atomic layer deposition; B1. Titanium dioxide; B2. Optical properties

Indexed keywords

AMORPHOUS SILICON; ENERGY GAP; FILM GROWTH; REFRACTIVE INDEX; SILICA; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE;

ATOMIC LAYER GROWTH;

EPITAXIAL GROWTH;

EID: 0036643744 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(02)01426-4 Document Type: Article

Times cited : (85)

References (23)

1
- 0006483573
- (1991) Nature , vol.353 , pp. 737
- O'Regan, B.¹ Grätzel, M.²

2
- 0033533282
- (1999) Sensors Actuators B , vol.57 , pp. 197
- Guidi, V.¹ Carotta, M.C.² Ferroni, M.³ Martinelly, G.⁴ Paglialonga, L.⁵ Comini, E.⁶ Sberveglieri, G.⁷

3
- 0028461602
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 3960
- Honda, T.¹ Yanashima, K.² Yoshino, J.³ Kukimoto, H.⁴ Koyama, F.⁵ Iga, K.⁶

4
- 0028514036
- (1994) Appl. Phys. A , vol.59 , pp. 239
- Klingler, M.¹ Weppner, W.²

5
- 0034272551
- (2000) J. Electrochem. Soc. , vol.147 , pp. 3319
- Schuisky, M.¹ Hårsta, A.² Aidla, A.³ Kukli, K.⁴ Kiisler, A.-A.⁵ Aarik, J.⁶

6
- 33646352430
- (1993) J. Vac. Sci. Technol. A , vol.11 , pp. 2419
- Chen, S.¹ Mason, M.G.² Gysling, H.J.³ Paz-Pujalt, G.R.⁴ Blanton, T.N.⁵ Castro, T.⁶ Chen, K.M.⁷ Fictorie, C.P.⁸ Gladfelter, W.L.⁹ Franciosi, A.¹⁰ Cohen, P.I.¹¹ Evans, J.F.¹²

7
- 0027646309
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 3561
- Fukushima, K.¹ Takaoka, G.H.² Yamada, I.³

8
- 0343390452
- (1999) J. Phys. IV , vol.9
- Schuisky, M.¹ Hårsta, A.²

9
- 0035500943
- (2001) Thin Solid Films , vol.397 , pp. 157
- Herman, G.S.¹ Gao, Y.²

10
- 0025683727
- (1990) Acta Polytech. Scand. Chem. Technol. Ser. , vol.195 , pp. 155
- Aleskovskii, V.B.¹ Drozd, V.E.²

11
- 0009453364
- (1993) Thin Solid Films , vol.225 , pp. 228
- Ritala, M.¹ Leskelä, M.² Nykänen, E.³ Soininen, P.⁴ Niinistö, L.⁵

12
- 0029264144
- (1995) J. Crystal Growth , vol.148 , pp. 268
- Aarik, J.¹ Aidla, A.² Uustare, T.³ Sammelselg, V.⁴

13
- 0034513072
- (2000) J. Crystal Growth , vol.220 , pp. 531
- Aarik, J.¹ Aidla, A.² Mändar, H.³ Sammelselg, V.⁴

14
- 0035282191
- (2001) Appl. Surf. Sci. , vol.172 , pp. 148
- Aarik, J.¹ Aidla, A.² Mändar, H.³ Uustare, T.⁴

15
- 0032653080
- (1999) Thin Solid Films , vol.340 , pp. 110
- Aarik, J.¹ Aidla, A.² Kiisler, A.-A.³ Uustare, T.⁴ Sammelselg, V.⁵

16
- 0009407217
- JCPDS-International Centre for Diffaction Data, PDF 21-1272

17
- 0009400179
- JCPDS-International Centre for Diffaction Data, PDF 21-1276

18
- 0036467262
- (2002) J. Crystal Growth , vol.235 , pp. 293
- Schuisky, M.¹ Kukli, K.² Aarik, J.³ Lu, J.⁴ Hårsta, A.⁵

19
- 0031213381
- (1997) Thin Solid Films , vol.305 , pp. 270
- Aarik, J.¹ Aidla, A.² Kiisler, A.-A.³ Uustare, T.⁴ Sammelselg, V.⁵

20
- 0033332743
- (1999) Thin Solid Films , vol.355 , pp. 6
- Bendavid, A.¹ Martin, P.J.² Jamting, Å.³ Takigawa, H.⁴

21
- 0028368703
- (1994) J. Appl. Phys. , vol.75 , pp. 2042
- Tang, H.¹ Prasad, K.² Sanjinès, R.³ Schmid, P.E.⁴ Lévy, F.⁵

22
- 0034246448
- (2000) Appl. Surf. Sci. , vol.162-163 , pp. 565
- Monticone, S.¹ Tufeu, R.² Kanaev, A.V.³ Scolan, E.⁴ Sanchez, C.⁵

23
- 36149008514
- (1965) Phys. Rev. , vol.137
- Cardona, M.¹ Harbeke, G.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.