Atomic layer deposition of Al203 and Ti02 multilayers for applications as bandpass filters and antireflection coatings

Applied Optics

Volumn 48, Issue 9, 2009, Pages 1727-1732

  Szeghalmi, Adriana ^a   Helgert, Michael ^b   Brunner, Robert ^b   Heyroth, Frank ^c   Gösele, Ulrich ^a   Knez, Mato ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b CARL ZEISS SMT AG   (Germany)

^c MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; BANDPASS FILTERS; FILM PREPARATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MULTILAYERS; REFRACTIVE INDEX; SILICON WAFERS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; WATER;

ANTI REFLECTIVE COATINGS; BK7 GLASS; NARROW BANDPASS FILTERS; OXYGEN SOURCES; POLYCARBONATE SUBSTRATES; SI WAFER; SUBSTRATE TEMPERATURE; TEMPERATURE-INSENSITIVE;

ATOMIC LAYER DEPOSITION;

EID: 65249141156     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.48.001727     Document Type: Article

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