Tailoring the properties of atomic layer deposited nickel and nickel carbide thin films via chain-length control of the alcohol reducing agents

Journal of Physical Chemistry C

Volumn 118, Issue 40, 2014, Pages 23385-23392

  Sarr, Mouhamadou ^a   Bahlawane, Naoufal ^a   Arl, Didier ^a   Dossot, Manuel ^b   McRae, Edward ^b   Lenoble, Damien ^a  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^b UNIVERSITÉ DE LORRAINE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC LAYER DEPOSITION; ATOMS; CARBIDES; CARBON; CARBON FILMS; CRYSTALLITE SIZE; HYDROGEN; METHANOL; MORPHOLOGY; NANOCRYSTALS; NICKEL COATINGS; NICKEL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; THIN FILMS;

ATOMIC LAYER DEPOSITED; CONFORMAL COATINGS; ELECTRICALLY CONDUCTIVE; HEXAGONAL STRUCTURES; LOWER TEMPERATURES; NICKEL ACETYLACETONATE; SEQUENTIAL REACTION; SOFT FERROMAGNETIC;

REDUCING AGENTS;

EID: 84908149257     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp5068318     Document Type: Article

References (41)

1. Koo, K.-H.; Kapur, P.; Saraswat, K. C. Compact Performance Models and Comparisons for Gigascale On-Chip Global Interconnect Technologies IEEE Trans. Electron Devices 2009, 56, 1787-1798
2. Kulshrestha, N.; Misra, A.; Misra, D. S. Electrical Transport and Electromigration Studies on Nickel Encapsulated Carbon Nanotubes: Possible Future Interconnects Nanotechnology 2013, 24, 1-8
3. Johnson, B. C. Electrical Resistivity of Copper and Nickel Thin Film Interconnections J. Appl. Phys. 1990, 67, 3018-3024
4. Han-Bo-Ram, L.; Sung-Hwan, B.; Woo-Hee, K.; Gil, H. G.; Young Kuk, L.; Taek-Mo, C.; Chang Gyoun, K.; Chan Gyung, P.; Hyungjun, K. Plasma-Enhanced Atomic Layer Deposition of Ni Jpn. J. Appl. Phys. 2010, 49, 05FA11-(1)-05FA11-(4)
5. Kamineni, V. K.; Raymond, M.; Bersch, E. J.; Doris, B. B.; Diebold, A. C. Optical Metrology of Ni and NiSi Thin Films Used in the Self-Aligned Silicidation Process J. Appl. Phys. 2010, 107, 093525
6. George, S. M. Atomic Layer Deposition: An Overview Chem. Rev. 2010, 110, 111-131
7. Zhefeng, L.; Gordon, R.; Pallem, V.; Li, H.; Shenai, D. Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films Chem. Mater. 2010, 22, 3060-3066
8. Protopopova, S. V.; Alexrandov, S. E. Mass-Spectrometric and Kinetic Study of Ni films MOCVD From Bis-(Ethylcyclopentadienyl) Nickel Surf. Coat. Technol. 2013, 230, 316-321
9. Lim, J. T.; Lee, J. C.; Lee, W. I.; Lee, I. A Study of the Development of CVD Precursors III-Synthesis and Properties of New Lead b-Diketonate Derivatives Bull. Korean Chem. Soc. 1999, 20, 355-361
10. Maruyama, T.; Tago, T. Nickel Thin Films Prepared by Chemical Vapour Deposition From Nickel Acetylacetonate J. Mater. Sci. 2010, 28, 5345-5348
11. Utriainen, M.; Kröger-Laukkanen, M.; Johansson, L.-S.; Niinist, L. Studies of Metallic Thin Film Growth in an Atomic Layer Epitaxy Reactor Using M(acac)2 (M=Ni, Cu, Pt) Precursors Appl. Surf. Sci. 2000, 157 (3) 151-158
12. Booyong, S. L.; Anthi, R.; Gordon, R. G. Atomic Layer Deposition of Transition Metals Nat. Mater. 2003, 2, 749-754
13. Li, Z.; Gordon, R. G.; Pallem, V.; Li, H.; Shenai, D. V. Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films Chem. Mater. 2010, 22, 3060-3066
14. Bahlawane, N.; Kohse-Höinghaus, K.; Premkumar, P. A.; Lenoble, D. Advances in the Deposition Chemistry of Metal-Containing Thin Films Using Gas Phase Process Chem. Sci. 2012, 3, 929-941
15. Premkumar, P. A.; Bahlawane, N.; Kohse-Höinghaus, K. CVD of Metals Using Alcohols and Metal Acetylacetonate, Part I: Optimization of Process Parameters and Electrical Characterization of Synthesized films Chem. Vap. Deposition. 2007, 13, 219-226
16. Bahlawane, N.; Premkumar, P. A.; Tian, Z.; Hong, X.; Qi, F.; Kohse-Höinghaus, K. Nickel and Nickel-Based Nanoalloy Thin Films from Alcohol-Assisted Chemical Vapor Deposition Chem. Mater. 2010, 22, 92-100
17. Chalker, P. R.; Romani, S.; Marshall, P. R.; Rosseinsky, M. J.; Rushworth, S.; Williams, P. A. Liquid Injection Atomic Layer Deposition of Silver Nanoparticles Nanotechnology 2010, 21, 405602
18. Dunbar, R. E.; Arnold, M. R. Catalytic Dehydrogenation of Primary and Secondary Alcohols with Copper-Chromium Oxide J. Org. Chem. 1945, 10 (6) 501-504
19. Badin, E. J.; Pacsu, E. Mechanism of Catalytic Hydrogenation and Dehydrogenation of Aldehydes and Alcohols PRINCETON 1944, 66, 1963-1967
20. Lokras, S. S.; Deshpande, P. K.; Kuloor, N. R. Catalytic Dehydrogenation of 2-Propanol to Acetone Ind. Eng. Chem. 1970, 9, 293-297
21. Church, J. M.; Joshi, H. K. Acetaldehyde by Dehydrogenation of Ethyl Alcohol Ind. Eng. Chem. 1951, 43, 1804-1811
22. Premkumar, P. A.; Bahlawane, N.; Reiss, G. CVD of Metals Using Alcohols and Metal Acetylacetonate, Part II: Role of Solvent and Characterization of Metal Films Made by Pulsed Spray Evaporation CVD Chem. Vap. Deposition 2007, 13, 227-231
23. Bahlawane, N.; Premkumar, P. A.; Brechling, A.; Reiss, G.; Kohse-Höinghaus, K. Alcohols-Assisted CVD of Silver Using Commercially Available Precursors Chem. Vap. Deposition 2007, 13, 401-407
24. Suntola, T. Surface Chemistry of Materials Deposition at Atomic Layer Level Appl. Surf. Sci. 1996, 100/101, 391-398
25. Puurunen, R. L.; Zeelie, T. A.; Krause, A. O. I. Cobalt(III) Acetylacetonate Chemisorbed on Aluminium-Nitride-Modified Silica: Characteristics and Hydroformulation Activity Catal. Lett. 2002, 83, 27-32
26. Babich, I. V.; Plyuto, Y. V.; Van Langeveld, A. D.; Moulijn, J. A. Role of the Support Nature in Chemisorption of Ni(acac), on the Surface of Silica and Alumina Appl. Surf. Sci. 1997, 115, 267-272
27. 2 Model Catalysts J. Phys. Chem. B 1998, 102, 9541-9549
28. 3 Appl. Catal., A 1996, 144, 177-194
29. Busca, G.; Costantino, U.; Montanari, T.; Ramis, G.; Resini, C.; Sisani, M. Nickel Versus Cobalt Catalysts for Hydrogen Production by Ethanol Steam Reforming: Ni-Co-Zn-Al Catalysts From Hydrotalcite-like Precursors Int. J. Hydrogen Energy 2010, 35, 5356-5366
30. Su, S.; Prairie, M. R.; Renken, A. Reaction Mechanism of Methanol Dehydrogenation on a Sodium Corbonate Catalyst Appl. Catal., A 1992, 91, 131-142
31. Grosvenor, A. P.; Biesinger, M. C.; Smart, R.; McIntyre, N. S. New Interpretations of XPS Spectra of Nickel Metal and Oxides Surf. Sci. 2006, 600, 1771-1779
32. Marcus, P.; Grimal, J. M. The Anodic Dissolution and Passivation of Ni Cr Fe Alloys Studied by ESCA Corros. Sci. 1992, 33, 805-814
33. Barr, T. L. An ESCA Study of the Termination of the Passivation of Elemental Metals J. Phys. Chem. 1978, 82, 1801-1810
34. Kim, K. S.; Winograd, N. X-Ray Photoelectron Spectroscopic Studies of Nickel-oxygen Surfaces Using Oxygen and Argon Ion-Bombardment Surf. Sci. 1974, 43, 625-643
35. Abrasonis, G.; Scheinost, A. C.; Zhou, S.; Torres, R.; Gago, R.; Ignacio, I.; Kuepper, K.; Potzger, K.; Krause, M.; Kolitsch, A.; Möller, W.; Bartkowski, S.; Neumann, M.; Gareev, R. X-ray Spectroscopic and Magnetic Investigation of C:Ni Nanocomposite Films Grown by Ion Beam Co-Sputtering J. Phys. Chem. C 2008, 112, 12628-12637
36. Premkumar, P. A.; Turchanin, A.; Bahlawane, N. Effect of Solvent on the Growth of Co and Co2C Using Pulsed-Spray Evaporation Chemical Vapor Deposition Chem. Mater. 2007, 19, 6206-6211
37. Abrasonis, G.; Krause, M.; Mücklich, A.; Sedlačková, K.; Radnóczi, G.; Kreissig, U.; Kolitsch, A.; Möller, W. Growth Regimes and Metal Enhanced 6-Fold Ring Clustering of Carbon in Carbon-Nickel Composite Thin Films Carbon. 2007, 45, 2995-3006
38. Tang, Y.; Zhao, D.; Shen, D.; Zhang, J.; Li, B.; Lu, Y.; Fan, X. Fabrication and Magnetization Measurement of Ni Thin Films on Silicon Substrate by Electrodeposition Thin Solid Films 2008, 516, 2094-2098
39. Zeng, Q.; Baker, I.; Sun, Y.; Cui, J. B.; Daghlian, C. P. The Thickness Dependence of the Microstructure and Magnetic Anisotropy of Sputtered Fe50Ni50 Films J. Appl. Phys. 2009, 105, 123923
40. Chen, C.; He, L.; Leng, Y.; Li, X. Weak Ferromagnetism and Spin-Glass State With Nanosized Nickel Carbide J. Appl. Phys. 2006, 99, 08M302
41. Krein, A.; Udelhoven, T.; Audinot, J. N.; Hissler, C.; Guignard, C.; Pfister, L.; Migeon, H. N.; Hoffmann, L. Imaging Chemical Patches on Near-Surface Atmospheric Dust Particles with NanoSIMS 50 to Identify Material Sources Water Air Soil Pollut. 2008, 8, 495-503