Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate

Journal of Materials Science

Volumn 28, Issue 19, 1993, Pages 5345-5348

  Maruyama, T ^a   Tago, T ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; FILM PREPARATION; NICKEL; ORGANOMETALLICS;

NICKEL ACETYLACETONATE; POLYCRYSTALLINE THIN FILMS;

THIN FILMS;

EID: 0027683452     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/BF00570088     Document Type: Article

References (6)

1. Vapor Deposition of Metals by Hydrogen Reduction of Metal Chelates