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Volumn 100-101, Issue , 1996, Pages 391-398
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Surface chemistry of materials deposition at atomic layer level
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPOSITION;
CRYSTAL ATOMIC STRUCTURE;
EPITAXIAL GROWTH;
MOLECULAR STRUCTURE;
PROCESS CONTROL;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR MATERIALS;
SEMICONDUCTOR SUPERLATTICES;
SURFACES;
ATOMIC LAYER EPITAXY;
ATOMIC LAYER LEVEL;
CONTROLLED GROWTH;
SURFACE CHEMISTRY;
THIN FILM ELECTROLUMINESCENT DISPLAYS;
DEPOSITION;
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EID: 0030564312
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/0169-4332(96)00306-6 Document Type: Article |
Times cited : (111)
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References (44)
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