Fabrication and magnetization measurement of Ni thin films on silicon substrate by electrodeposition

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 2094-2098

  Tang, Yang ^a,b   Zhao, Dongxu ^a   Shen, Dezhen ^a   Zhang, Jiying ^a   Li, Binghui ^a   Lu, Youming ^a   Fan, Xiwu ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Deposition process; Electrochemistry; Magnetic properties; Measurements; Nickel

Indexed keywords

ELECTROCHEMISTRY; ELECTRODEPOSITION; HYSTERESIS LOOPS; MAGNETIC PROPERTIES; NICKEL; SCANNING ELECTRON MICROSCOPY;

DEPOSITION PROCESS; DEPOSITION TIME; MAGNETOMETER MEASUREMENT;

MAGNETIC THIN FILMS;

EID: 38649087953     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.11.095     Document Type: Article

References (9)

1. Wolf S.A., Awschalom D.D., Buhrman R.A., Daughton J.M., von Molnar S., Roukes M.L., Chtchelkanova A.Y., and Treger T.M. Science 294 (2001) 1488
2. Scheck C., Evans P., Zangari G., and Schad R. Appl. Phys. Lett. 82 (2003) 2853
3. Bubbiotti G., Carlotti G., Tacchi S., Liu Y.K., Scheck C., Schad R., and Zangari G. J. Appl. Phys. 97 (2005) 10J102
4. Munford M.L., Seligman L., Satrorelli M.L., Voltoline E., Martins L.F.O., Schwarzacher W., and Pasa A.A. J. Magn. Magn. Mater. 226-230 (2001) 1613
5. Chang Y.J., and Erskine J.L. Phys. Rev., B 28 (1983) 5766
6. Chow G.M., Zhang J., Li Y.Y., Ding J., and Goh W.C. Mater. Sci. Eng., A 304-306 (2001) 194
7. Zeng Q., Baker I., Sun Y., Cui J.B., and Daghlian C.P. J. Appl. Phys. 99 (2006) 08M302
8. Kim J.G., Han K.H., Song S.H., and Reilly A. Thin Solid Films 440 (2003) 54
9. Cullity B.D. Elements of X-ray Diffractions (1978), Addition-Wesley, Reading, MA 102