Mass-spectrometric and kinetic study of Ni films MOCVD from bis-(ethylcyclopentadienyl) nickel

Surface and Coatings Technology

Volumn 230, Issue , 2013, Pages 316-321

  Protopopova, V S ^a   Alexandrov, S E ^a  

^a PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

Author keywords

Bis (ethylcyclopentadienyl) nickel; Chemical vapor deposition; Mass spectrometry; Morphology; Nickel films; Process kinetics

Indexed keywords

CHEMICAL VAPOR DEPOSITIONS (CVD); DEPOSITED LAYER; DEPOSITION TEMPERATURES; MODEL REACTIONS; NICKEL FILM; PROCESS KINETICS; REACTION SYSTEM; TEMPERATURE RANGE;

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; GROWTH KINETICS; KINETICS; METALLIC FILMS; MORPHOLOGY; VAPORS;

NICKEL;

EID: 84881313788     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.06.057     Document Type: Article

References (24)

1. Choi Y.C., Shin Y.M., Lim S.C., Bae D.J., Lee Y.H., Lee B.S. J. Appl. Phys. 2000, 88(5):4898-4903.
2. Pollard A.J., Nair R.R., Sabki S.N., Staddon C.R., Perdigao L.M.A., Hsu C.H., Garfitt J.M., Gangopadhyay S., Gleeson H.F., Geim A.K., Beton P.H. J. Phys. Chem. C Lett. 2009, 113(38):16565-16567.
3. Shalygina E.E., Kozlovskii L.V., Abrosimova N.M., Mukasheva M.A. Phys. Solid State 2005, 47(4):684-689.
4. Mi Y.Y., Wang S.J., Zegenhagen J., Chai J.W., Pan J.S., Huan C.H.A., Feng Y.P., Ong C.K. Appl. Phys. Lett. 2009, 94:242903. (-1-3).
5. Paserin V., Marcuson S., Wilkinson D.S. Adv. Eng. Mater. 2004, 6(6):454-459.
6. Premkumar P.A., Dasgupta A., Kuppusami P., Parameswaran P., Mallika C., Nagaraja K.S., Raghunathan V.S. Chem. Vap. Depos. 2006, 12:39-45.
7. Van Hemert R.L., Spendlove L.B., Sievers R.E. J. Electrochem. Soc. 1965, 122(11):1123-1126.
8. Bakovets V.V., Mitkin V.N., Gelfond N.V. Chem. Vap. Depos. 2005, 11:368-374.
9. Andreev O.N., Bespal'ko O.P., Mar'in V.P., Vishinskaia L.I., Razuvaev G.A. Organomet. Chem. USSR 1988, 1(5):1184-1186.
10. Kaplin Y.A., Belysheva G.V., Zhiltsov S.F. J. Gen. Chem. 1980, 50(1):118-121.
11. Brissonneau L., Reynes A., Vahlas C. J. Phys. IV France 1999, 9. (Pr8-57-64).
12. Kang J.-K., Rhee S.-W. J. Mater. Res. 2000, 15(8):1828-1833.
13. Alexandrov S.E., Protopopova V.S. J. Nanosci. Nanotechnol. 2011, 11:8259-8263.
14. Protopopova V.S., Alexandrov S.E. Russ. J. Appl. Chem. 2012, 85(5):741-745.
15. Anufriev G.S., Boltenkov B.S., Ryabinkov A.I. Tech. Phys. 2006, 51(1):100-111.
16. Turnbull A.G. Aust. J. Chem. 1967, 20:2757-2760.
17. Dyagileva L.M., Mar'in V.P., Tsyganova E.I., Razuvaev G.A. J. Organomet. Chem. 1979, 175:63-72.
18. Pugmire D.L., Woodbridge C.M., Boag N.M., Langell M.A. Surf. Sci. 2001, 472(3):155-171.
19. Gurvich L.V., Karachevtsev G.V., Kondratyev V.N., Lebedev Yu.A., Medvedev V.A., Potapov V.K., Khodeyev Yu.S. Energies of Chemical Bond Breaking 1974, Nauka, Moscow.
20. Nesmeyanov A.N. Ferrocene and related compounds. Selecta 1969-1979, Nauka, Moscow.
21. Mukhina T.N., Barabanov N.L., Babash S.E. Pyrolysis of Hydrocarbon Crude 1987, Khimiya, Moscow.
22. Hore N.R., Russell D.K. New J. Chem. 2004, 28:606-613.
23. Bacskay G.B., Mackie J.C. Phys. Chem. Chem. Phys. 2001, 3:2467-2473.
24. Chenthamarai S., Jayaraman D., Subramanian C. Mater. Chem. Phys. 2000, 63(2):163-166.