High aspect ratio x-ray waveguide channels fabricated by e-beam lithography and wafer bonding

Journal of Applied Physics

Volumn 115, Issue 21, 2014, Pages

  Neubauer, H ^a   Hoffmann, S ^a   Kanbach, M ^a   Haber, J ^a   Kalbfleisch, S ^a   Kruger S P ^a   Salditt, T ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CLADDING (COATING); ELECTRON BEAM LITHOGRAPHY; WAVEGUIDES;

DEVICE FABRICATIONS; E-BEAM LITHOGRAPHY; FABRICATION AND CHARACTERIZATIONS; LATERAL STRUCTURES; OPTICAL CHARACTERIZATION; ORTHOGONAL DIRECTIONS; PARAMETER OPTIMIZATION; WAVEGUIDE CHANNELS;

X RAYS;

EID: 84902602916     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4881495     Document Type: Article

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