-
1
-
-
84878187651
-
-
This document is located at It was last updated on 11 January
-
ESPRIT, Microelectronics Advanced Research Initiative (MEL-ARI). This document is located at http://www.cordis.lu/esprit/src/melop-rm.htm. It was last updated on 11 January 2000.
-
(2000)
Microelectronics Advanced Research Initiative (MEL-ARI)
-
-
-
2
-
-
0006503271
-
Process-induced mechanical stress in isolation structures studied by micro-Raman spectroscopy
-
De Wolf, I., Norstrom, H. & Maes, H.E. Process-induced mechanical stress in isolation structures studied by micro-Raman spectroscopy. J. Appl. Phys. 74, 4490-4500 (1993).
-
(1993)
J. Appl. Phys.
, vol.74
, pp. 4490-4500
-
-
De Wolf, I.1
Norstrom, H.2
Maes, H.E.3
-
3
-
-
0031355986
-
Strain measurements in thin film structures by convergent beam electron diffraction
-
Armigliato, A. et al. Strain measurements in thin film structures by convergent beam electron diffraction. J. Phys. III 7, 2375-2381 (1997).
-
(1997)
J. Phys. III
, vol.7
, pp. 2375-2381
-
-
Armigliato, A.1
-
4
-
-
0019529896
-
Accurate microcrystallography at high spatial resolution using electron back-scattering patterns in a field emission gun scanning electron microscope
-
Harland, C. J., Akhter, P. & Venables, J. A. Accurate microcrystallography at high spatial resolution using electron back-scattering patterns in a field emission gun scanning electron microscope. J. Phys. E 14, 175-182 (1981)
-
(1981)
J. Phys. E
, vol.14
, pp. 175-182
-
-
Harland, C.J.1
Akhter, P.2
Venables, J.A.3
-
5
-
-
0030111195
-
Measurement of elastic strains and small lattice rotations using electron back scatter diffraction
-
Wilkinson, A. J. Measurement of elastic strains and small lattice rotations using electron back scatter diffraction. Ultramicroscopy 62, 237-247 (1996)
-
(1996)
Ultramicroscopy
, vol.62
, pp. 237-247
-
-
Wilkinson, A.J.1
-
6
-
-
0001127312
-
Electromigration-induced stress in aluminum conductor lines measured by x-ray microdiffraction
-
Wang, P. C., Cargill III, G. S., Noyan, I. C. & Hu, C.-K. Electromigration-induced stress in aluminum conductor lines measured by x-ray microdiffraction. Appl. Phys. Lett. 72, 1296-1298 (1998).
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 1296-1298
-
-
Wang, P.C.1
Cargill G.S. III2
Noyan, I.C.3
Hu, C.-K.4
-
7
-
-
36749107580
-
Propagation of x-rays in waveguides
-
Spiller, E. & Segmueller, A. Propagation of x-rays in waveguides. Appl. Phys. Lett. 24, 60-61 (1974).
-
(1974)
Appl. Phys. Lett.
, vol.24
, pp. 60-61
-
-
Spiller, E.1
Segmueller, A.2
-
8
-
-
0000916344
-
Properties of a submicrometer x-ray beam at the exit of a waveguide
-
Jark, W. et al. Properties of a submicrometer x-ray beam at the exit of a waveguide. J. Appl. Phys. 80, 4831-4836 (1996).
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 4831-4836
-
-
Jark, W.1
-
9
-
-
0026941197
-
Resonance-Enhanced X-rays in thin films: A structure probe for membranes and surface layers
-
Wang, J., Bedzyk, M. J. & Caffrey, M. Resonance-Enhanced X-rays in thin films: a structure probe for membranes and surface layers. Science 258, 775-778 (1992).
-
(1992)
Science
, vol.258
, pp. 775-778
-
-
Wang, J.1
Bedzyk, M.J.2
Caffrey, M.3
-
10
-
-
0003391643
-
-
Wiley, & Sons, New York
-
Yariv, A. Quantum Electronics, 3rd edn, 115-129 (Wiley, & Sons, New York, 1989).
-
(1989)
Quantum Electronics, 3rd Edn
, pp. 115-129
-
-
Yariv, A.1
-
12
-
-
0031551596
-
Phase contrast hard x-ray microscopy with submicron resolution
-
Lagomarsino, S. et al. Phase contrast hard x-ray microscopy with submicron resolution. Appl. Phys. Lett. 71, 2557-2559 (1997).
-
(1997)
Appl. Phys. Lett.
, vol.71
, pp. 2557-2559
-
-
Lagomarsino, S.1
-
13
-
-
0014773447
-
Local oxidation of silicon and its application in semiconductor-device technology
-
Appels, J. A., Kooi, E., Paffen, M. M., Schatorge, J. J. H. & Verkuylen, W. H. C. G. Local oxidation of silicon and its application in semiconductor-device technology. Philips Res. Rep. 25, 118-132 (1970).
-
(1970)
Philips Res. Rep.
, vol.25
, pp. 118-132
-
-
Appels, J.A.1
Kooi, E.2
Paffen, M.M.3
Schatorge, J.J.H.4
Verkuylen, W.H.C.G.5
-
14
-
-
0001836675
-
FRELON camera: Fast Readout Low Noise
-
Labiche, J. C., Segura-Puchades, D., Van Brussel, D. & Moy, J. P. FRELON camera: Fast Readout Low Noise, ESRF Newslett. 25, 41-43 (1996).
-
(1996)
ESRF Newslett.
, vol.25
, pp. 41-43
-
-
Labiche, J.C.1
Segura-Puchades, D.2
Van Brussel, D.3
Moy, J.P.4
-
15
-
-
0001949942
-
-
eds Authier, A., Lagomarsino, S. & Tanner, B. K. Plenum, New York
-
Fewster, P. F. in X-ray and Neutron Dynamical Diffraction: Theory and Applications (eds Authier, A., Lagomarsino, S. & Tanner, B. K.) 269-288 (Plenum, New York, 1996).
-
(1996)
X-ray and Neutron Dynamical Diffraction: Theory and Applications
, pp. 269-288
-
-
Fewster, P.F.1
-
16
-
-
33745905893
-
Stress-related problems in silicon technology
-
Hu, S. M. Stress-related problems in silicon technology. J. Appl. Phys. 70, R53-R80 (1991).
-
(1991)
J. Appl. Phys.
, vol.70
-
-
Hu, S.M.1
-
17
-
-
0000806531
-
Stresses and strains in lattice-mismatched stripes, quantum wires, quantum dots, and substrates in Si technology
-
Jain, S. C., Maes, H. E., Pinardi, K. & De Wolf, I. Stresses and strains in lattice-mismatched stripes, quantum wires, quantum dots, and substrates in Si technology. J. Appl. Phys. 79, 8145-8165 (1996).
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 8145-8165
-
-
Jain, S.C.1
Maes, H.E.2
Pinardi, K.3
De Wolf, I.4
-
18
-
-
0004139644
-
-
ed. Eucken, A. Springer-Verlag, Berlin
-
Landolt, H. H. & Bornstein, R. in Zahlenwerte und Funktionen aus Physik, Chemie, Astronomie, Geophysik und Technik (ed. Eucken, A.) (Springer-Verlag, Berlin, 1950).
-
(1950)
Zahlenwerte und Funktionen aus Physik, Chemie, Astronomie, Geophysik und Technik
-
-
Landolt, H.H.1
Bornstein, R.2
-
19
-
-
0001457411
-
Theorie dynamique de la diffraction des rayons X par les cristaux deformes
-
Taupin, D. Theorie dynamique de la diffraction des rayons X par les cristaux deformes. Bull. Soc. Fr. Miner. Cristallogr. 87, 469-511 (1964).
-
(1964)
Bull. Soc. Fr. Miner. Cristallogr.
, vol.87
, pp. 469-511
-
-
Taupin, D.1
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