Hard X-ray microscopy with reflecting mirrors status and perspectives of the ESRF technology

Journal De Physique. IV : JP

Volumn 104, Issue , 2003, Pages 231-234

  Hignette, O ^a   Cloetens, P ^a   Lee, W K ^b   Ludwig, W ^a   Rostaing, G ^a  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICS; FLUORESCENCE; IMAGING SYSTEMS; LIGHT REFLECTION; OPTICAL SYSTEMS; SCANNING; X RAY MICROSCOPES;

DIFFRACTION SIZE; MICROFLUORESCENCE SCANNING IMAGING; OPTICAL MANUFACTURING TECHNOLOGY; SYNCHROTRON SOURCES; X RAY MICROSCOPY;

MIRRORS;

EID: 0038363986     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:200300068     Document Type: Conference Paper

References (9)

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