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Volumn 49, Issue 14, 2014, Pages 5035-5042

Anatase andrutile TiO2 thin films prepared by reactive DC sputtering at high deposition rates on glass and flexible polyimide substrates

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EID: 84900401425     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-014-8209-0     Document Type: Article
Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.