Thickness dependence of the optical properties of sputter deposited Ti oxide films

Thin Solid Films

Volumn 365, Issue 1, 2000, Pages 119-125

  Rodriguez J ^a   Gomez M ^a   Ederth, J ^a   Niklasson, G A ^a   Granqvist, C G ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; ENERGY GAP; LIGHT ABSORPTION; MAGNETRON SPUTTERING; OPTICAL COATINGS; REFRACTIVE INDEX; SPECTROPHOTOMETRY; SPUTTER DEPOSITION; TITANIUM OXIDES;

CRYSTALLINE FILMS; OXIDE FILMS; THICKNESS DEPENDENCE;

OPTICAL FILMS;

EID: 0343022269     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)01109-8     Document Type: Article

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