High rate and process control of reactive sputtering by gas pulsing: The Ti-O system

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 550-556

  Martin, Nicolas ^a   Bally, Alain R ^a   Hones, Peter ^a   Sanjinés, Rosendo ^a   Lévy, Francis ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; TARGETS; THIN FILMS;

GAS PULSING; REACTIVE SPUTTERING;

TITANIUM OXIDES;

EID: 1542320344     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01440-1     Document Type: Article

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