Preparation of ultra water-repellent films by microwave plasma-enhanced CVD

Thin Solid Films

Volumn 303, Issue 1-2, 1997, Pages 222-225

  Hozumi, Atsushi ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Chemical vapour deposition; Microwave plasma; Ultra water repellency

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CONTACT ANGLE; FILM PREPARATION; GROWTH (MATERIALS); MICROWAVES; PARTICLES (PARTICULATE MATTER); PLASMA APPLICATIONS; PRESSURE EFFECTS; SILANES; SURFACE ROUGHNESS;

FLUOROALKYL SILANE; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TETRAMETHYL SILANE; WATER REPELLANT FILMS;

WATERPROOF COATINGS;

EID: 0031186726     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00076-X     Document Type: Article

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