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Volumn 6, Issue 4, 2014, Pages 2917-2921

Chemical and structural investigation of high-resolution patterning with HafSOx

Author keywords

cross sectional TEM; electron beam lithography; hafnium oxide; inorganic resist; solution film deposition; thin film

Indexed keywords

CROSS-SECTIONAL TEM; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; FILM DEPOSITION; HIGH-RESOLUTION PATTERNING; INORGANIC RESIST; LITHOGRAPHIC PATTERNING; STRUCTURAL INVESTIGATION; TETRAMETHYL AMMONIUM HYDROXIDE;

EID: 84896850607     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am405463u     Document Type: Article
Times cited : (74)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.