Electron beam lithography - Resolution limits

Microelectronic Engineering

Volumn 32, Issue 1-4 SPEC. ISS., 1996, Pages 131-142

  Broers, Alee N ^a   Hoole Andrew C F, A C F ^a,b   Ryan, Joseph M ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF KWAZULU NATAL   (South Africa)

Author keywords

Electron beam lithography; Irradiated SiO2; PMMA; Resolutions limits

Indexed keywords

ELECTRON OPTICS; OPTICAL RESOLVING POWER; POLYMETHYL METHACRYLATES; RADIATION DAMAGE; RESISTORS; SILICA;

RESOLUTION LIMITS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0030231574     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00368-1     Document Type: Article

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