Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Trikeriotis, Markos ^a   Bae, Woo Jin ^a   Schwartz, Evan ^a   Krysak, Marie ^a   Lafferty, Neal ^b   Xie, Peng ^b   Smith, Bruce ^b   Zimmerman, Paul A ^c   Ober, Christopher K ^a   Giannelis, Emmanuel P ^a  

^a Cornell University   (United States)

^b Rochester Institute of Technology   (United States)

^c SEMATECH   (United States)

Author keywords

193 nm lithography; electron beam lithography; etch resistance; EUV lithography; inorganic photoresist

Indexed keywords

193 NM LITHOGRAPHY; CHEMICALLY AMPLIFIED RESIST; CRITICAL ASPECT RATIO; DEPTH OF FOCUS; E-BEAM LITHOGRAPHY; ELECTRON BEAM IMAGING; ETCH DATA; ETCH RESISTANCE; EUV LITHOGRAPHY; FEATURE SIZES; HARDMASKS; IMAGING DATA; INORGANIC PHOTORESISTS; INORGANIC RESIST; LINE EDGE ROUGHNESS; NEGATIVE TONE PHOTORESIST; NEGATIVE TONES; ORGANIC LIGANDS; PATTERN COLLAPSE; PHYSICAL CHARACTERISTICS; PROCESSING COSTS; RESIST THICKNESS; SOL-GEL PROCESSING; THICK RESIST;

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; GELS; HAFNIUM; HAFNIUM OXIDES; LIGANDS; MATERIALS; NANOCOMPOSITES; NANOPARTICLES; REFRACTIVE INDEX; ROUGHNESS MEASUREMENT; SOL-GEL PROCESS; SURFACE CHEMISTRY; SURFACE TREATMENT;

PHOTORESISTS;

EID: 77953490694     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846672     Document Type: Conference Paper

References (4)

1. Sewell, H., Mulkens, J., McCafferty, D., Markoya, L., Streefkerk, B. and Graeupner, P., "The next phase for immersion lithography," Proc. SPIE 6154, 615406 (2006).
2. Zimmerman, P., A., Rice, B., Rodriguez, R., Zettel, M., F., Trikeriotis, M., Wang, D., Yi, Y., Bae, W., J., Ober, C., K. and Giannelis, E., P., "The use of nanocomposite materials for high refractive index immersion lithography," J. Photopolym. Sci. Technol. 21(5), 621-629 (2008).
3. Bae, W. J., Trikeriotis, M., Rodriguez, R., Zettel, M. F., Piscani, E., Ober, C. K., Giannelis, E. P. and Zimmerman, P., "High-index nanocomposite photoresist for 193-nm lithography," Proceedings of SPIE Vol. 7273, 727326 (2009).
4. Trikeriotis, M., Rodriguez, R., Zettel, M. F., Bakandritsos, A., Bae, W. J., Zimmerman, P. A., Ober, C. K. and Giannelis, E. P., "High refractive index nanoparticle fluids for 193-nm immersion lithography," Proceedings of SPIE Vol. 7273, 72732A (2009).