High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3829-3833

  Tanenbaum, D M ^a   Lo, C W ^a   Isaacson, M ^a   Craighead, H G ^a   Rooks, M J ^b   Lee, K Y ^c   Huang, W S ^d   Chang, T H P ^c  

^a Cornell University   (United States)

^b Department of Theoretical and Applied Mechanics and the Cornell Nanofabrication Facility   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001042244     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588676     Document Type: Article

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