Key issues for fabrication of high quality amorphous and microcrystalline silicon solar cells

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 243-246

  Kondo, M ^a   Matsui, T ^a   Nasuno, Y ^a   Sonobe, H ^a   Shimizu, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Amorphous silicon; High rate deposition; Impurity; Microcrysatalline silicon; Solar cells

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; IMPURITIES; INTERFACES (COMPUTER);

HIGH RATE DEPOSITION; IMPURITY; MICROCRYSATALLINE SILICON;

SOLAR CELLS;

EID: 32644478803     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.243     Document Type: Conference Paper

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