Material Aspects of Reactively MF-Sputtered Zinc Oxide for TCO Application in Silicon Thin Film Solar Cells

Materials Research Society Symposium - Proceedings

Volumn 762, Issue , 2003, Pages 405-410

  Hüpkes, Jürgen ^a   Rech, Bernd ^a   Kluth, Oliver ^a   Müller, Joachim ^a   Siekmann, Hilde ^a   Agashe, Chitra ^a   Bochem, Hans P ^a   Wuttig, Matthias ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CURRENT DENSITY; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; ETCHING; HALL EFFECT; HYDROCHLORIC ACID; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SHORT CIRCUIT CURRENTS; STRESS ANALYSIS; STRUCTURE (COMPOSITION); SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

PLASMA EMISSION; PULSE FREQUENCY;

SILICON SOLAR CELLS;

EID: 1642459382     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-762-a7.11     Document Type: Conference Paper

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