SCOPUS 정보 검색 플랫폼

Volumn 31, Issue 2, 2002, Pages 129-135

Pulsed-magnetron-sputtered low-temperature indium tin oxide films for flat-panel display applications

(9) Lee, William J a Fang, Yean Kuen a Ho, Jyh Jier b Chen, Chin Ying b Tsai, Rung Ywan c Huang, Daoyang c Ho, Fang C c Chou, H W a Chen, C C a

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

b FORTUNE INSTITUTE OF TECHNOLOGY (Taiwan)

c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

Author keywords

DC pulsed magnetron sputtering; Electrical and optical properties; Indium tin oxide

Indexed keywords

ARGON; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; FLAT PANEL DISPLAYS; FREQUENCIES; LIQUID CRYSTAL DISPLAYS; MAGNETRON SPUTTERING; MIXTURES; OXYGEN; SEMICONDUCTING GLASS; SUBSTRATES; THIN FILMS;

BIPOLAR DIRECT CURRENT PULSED MAGNETRON SPUTTERING; DEPOSITION PARAMETERS; GLASS SUBSTRATES; POLAR MODES; REACTIVE PULSED SPUTTERING;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0036475114 PISSN: 03615235 EISSN: None Source Type: Journal
DOI: 10.1007/s11664-002-0159-7 Document Type: Article

Times cited : (15)

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