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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 1, 2014, Pages

Kinetic study on hot-wire-assisted atomic layer deposition of nickel thin films

(4) Yuan, Guangjie a Shimizu, Hideharu a Momose, Takeshi a Shimogaki, Yukihiro a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CONTAMINATION; DEPOSITION PROCESS; DEPOSITION TEMPERATURES; IMPURITY CONTENT; LANGMUIR-TYPE MODEL; NICKEL THIN FILM; PLASMA-INDUCED DAMAGE; RADICAL GENERATION;

DECOMPOSITION; DEPOSITION; METALLIC FILMS; NICKEL; WIRE;

ATOMIC LAYER DEPOSITION;

EID: 84891776293 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.4829361 Document Type: Article

Times cited : (21)

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