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Volumn 19, Issue 5, 2008, Pages 411-417

Formation and simulation of a thermally stable NiSi FUSI gate electrode by a novel integration process

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; MORPHOLOGY; NICKEL COMPOUNDS; PHASE STABILITY; PHASE TRANSITIONS; THERMODYNAMIC STABILITY; THRESHOLD VOLTAGE;

EID: 39849111647     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-007-9355-9     Document Type: Article
Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.