-
1
-
-
0036133199
-
-
1. H. Iwai T. Ohgura S. Ohmi 2002 Microelectron. Eng. 60 157 10.1016/S0167-9317(01)00684-0 1:CAS:528:DC%2BD38XhtFWmsL0%3D H. Iwai, T. Ohgura, S. Ohmi, Microelectron. Eng. 60, 157 (2002)
-
(2002)
Microelectron. Eng.
, vol.60
, pp. 157
-
-
Iwai, H.1
Ohgura, T.2
Ohmi, S.3
-
2
-
-
85121082603
-
-
2. A. Hokazono, K. Ohuchi, M. Takayanagi, Y. Watanabe, S. Magoshi, Y. Kato, T. Shimizu et al., IEDM Tech. Dig. 639 (2002)
-
-
-
-
3
-
-
85121082427
-
-
3. J.P. Lu, D. Miles, J. Zhao, A. Gurba, Y. Xu, C. Lin, M. Hewson et al., IEDM Tech. Dig. 371 (2002)
-
-
-
-
4
-
-
0001111214
-
-
4. Z. Ma L.H. Allen 1994 Phys. Rev. B 49 13501 Z. Ma, L.H. Allen, Phys. Rev. B 49, 13501 (1994)
-
(1994)
Phys. Rev.
, vol.B 49
, pp. 13501
-
-
Ma, Z.1
Allen, L.H.2
-
5
-
-
0027703140
-
-
5. K. Maex 1993 Mater. Sci. Eng. R 11 53 K. Maex, Mater. Sci. Eng. R 11, 53 (1993)
-
(1993)
Mater. Sci. Eng.
, vol.R 11
, pp. 53
-
-
Maex, K.1
-
6
-
-
0037470335
-
-
6. R.N. Huang J.Y. Feng Y. Huang 2003 Appl. Surf. Sci. 207 139 10.1016/S0169-4332(02)01327-2 1:CAS:528:DC%2BD3sXhs1Cns7g%3D R.N. Huang, J.Y. Feng, Y. Huang, Appl. Surf. Sci. 207, 139 (2003)
-
(2003)
Appl. Surf. Sci.
, vol.207
, pp. 139
-
-
Huang, R.N.1
Feng, J.Y.2
Huang, Y.3
-
7
-
-
0035556722
-
-
7. X.P. Qu C. Detavernier R.L. Meeirhaeghe Van F. Cardon 2001 MRS Proc. 670 K6101 K6106 X.P. Qu, C. Detavernier, R.L. Van Meirhaeghe, F. Cardon, MRS Proc. 670, K6101–K6106 (2001)
-
(2001)
MRS Proc.
, vol.670
, pp. K6101-K6106
-
-
Qu, X.P.1
Detavernier, C.2
Meeirhaeghe, R.L.3
Cardon, F.4
-
9
-
-
0035519420
-
-
9. A. Lauwers A. Steegen M. Potter de R. Lindsay A. Satta H. Bender K. Maex 2001 J. Vac. Sci. Technol. B 19 2026 A. Lauwers, A. Steegen, M. de Potter, R. Lindsay, A. Satta, H. Bender, K. Maex, J. Vac. Sci. Technol. B 19, 2026 (2001)
-
(2001)
J. Vac. Sci. Technol.
, vol.B 19
, pp. 2026
-
-
Lauwers, A.1
Steegen, A.2
Potter, M.3
Lindsay, R.4
Satta, A.5
Bender, H.6
Maex, K.7
-
10
-
-
0036776680
-
-
10. A. Lauwers M. Potter de O. Chamirian de R. Lindsay C. Demeurisse C. Vrancken K. Maex 2002 Microelectron. Eng. 64 131 10.1016/S0167-9317(02)00777-3 1:CAS:528:DC%2BD38XntVWltrc%3D A. Lauwers, M. de Potter, O. Chamirian, R. Lindsay, C. Demeurisse, C. Vrancken, K. Maex, Microelectron. Eng. 64, 131 (2002)
-
(2002)
Microelectron. Eng.
, vol.64
, pp. 131
-
-
Lauwers, A.1
Potter, M.2
Chamirian, O.3
Lindsay, R.4
Demeurisse, C.5
Vrancken, C.6
Maex, K.7
-
11
-
-
4344691172
-
-
11. K.L. Pey P.S. Lee D. Mangelinck 2004 Thin Solid Films 462–463 137 10.1016/j.tsf.2004.05.098 1:CAS:528:DC%2BD2cXntlejt7s%3D K.L Pey, P.S. Lee, D. Mangelinck, Thin Solid Films 462–463, 137 (2004)
-
(2004)
Thin Solid Films
, vol.462–463
, pp. 137
-
-
Pey, K.L.1
Lee, P.S.2
Mangelinck, D.3
-
13
-
-
85121085731
-
-
13. W.P. Maszara, Z. Krivokapic, P. King, J.-S. Goo, M.-R. Lin, 2002 IEDM Tech. Dig. 367, (2002)
-
-
-
-
14
-
-
85121067589
-
-
14. M.A. Pawlak, A. Lauwers, T. Janssens, K.G. Anil, K. Opsomer, K. Maex, A. Vantomme, J.A. Kittl, IEEE Electron Device Lett. 27, 99 (2006)
-
-
-
-
15
-
-
85121074158
-
-
15. ISE Systems, TCAD Suite, http://www.ise.com
-
-
-
-
16
-
-
85121066078
-
-
16. Integrated System Engineering, ISE TCAD, AG, Zurich, Switzerland, 1998
-
-
-
-
17
-
-
0021444627
-
-
17. F. Heurle C.S. Petersson J.E.E. Baglin S.J. Placa C.Y. Wong 1984 J. Appl. Phys. 55 4208 10.1063/1.333021 F. Heurle, C.S. Petersson, J.E.E. Baglin, S.J. Placa, C.Y. Wong, J. Appl. Phys. 55, 4208 (1984)
-
(1984)
J. Appl. Phys.
, vol.55
, pp. 4208
-
-
Heurle, F.1
Petersson, C.S.2
Baglin, J.E.E.3
Placa, S.J.4
Wong, C.Y.5
-
18
-
-
5544306527
-
-
18. J.A. Kittl A. Lauwers O. Chamirian M.A. Pawlak M. A. Dal Van A. Akheyar M. Potter De A. Kottantharayil G. Pourtois R. Lindsay K. Maex 2004 Mater. Res. Soc., Symp. Proc. 810 31 1:CAS:528:DC%2BD2cXot1Gqt7g%3D J.A. Kittl, A. Lauwers, O. Chamirian, M.A. Pawlak, M. Van Dal, A. Akheyar, M. De Potter, A. Kottantharayil, G. Pourtois, R. Lindsay, K. Maex, Mater. Res. Soc., Symp. Proc. 810, 31 (2004)
-
(2004)
Mater. Res. Soc., Symp. Proc.
, vol.810
, pp. 31
-
-
Kittl, J.A.1
Lauwers, A.2
Chamirian, O.3
Pawlak, M.A.4
Dal, M.A.5
Akheyar, A.6
Potter, M.7
Kottantharayil, A.8
Pourtois, G.9
Lindsay, R.10
Maex, K.11
-
19
-
-
0142055828
-
-
19. C. Lavoie F.M. d’Heurle C. Detavernier C. Cabral Jr. 2003 Microelectron. Eng. 70 144 10.1016/S0167-9317(03)00380-0 1:CAS:528:DC%2BD3sXot1Cisro%3D C. Lavoie, F.M. d’Heurle, C. Detavernier, C. Cabral Jr., Microelectron. Eng. 70, 144 (2003)
-
(2003)
Microelectron. Eng.
, vol.70
, pp. 144
-
-
Lavoie, C.1
d’Heurle, F.M.2
Detavernier, C.3
Cabral, C.4
-
20
-
-
28044454327
-
-
20. J.A. Kittl A. Lauwers M.A. Pawlak M. Dal Van A. Veloso K.G. Anil G. Pourtois C. Demeurisse T. Schram B. Brijs M. Potter De C. Vrancken K. Maex 2005 Microelectron. Eng. 82 441 10.1016/j.mee.2005.07.084 1:CAS:528:DC%2BD2MXht1Oku7fO J.A. Kittl, A. Lauwers, M.A. Pawlak, M. Van Dal, A. Veloso, K.G. Anil, G. Pourtois, C. Demeurisse, T. Schram, B. Brijs, M. De Potter, C. Vrancken, K. Maex, Microelectron. Eng. 82, 441 (2005)
-
(2005)
Microelectron. Eng.
, vol.82
, pp. 441
-
-
Kittl, J.A.1
Lauwers, A.2
Pawlak, M.A.3
Dal, M.4
Veloso, A.5
Anil, K.G.6
Pourtois, G.7
Demeurisse, C.8
Schram, T.9
Brijs, B.10
Potter, M.11
Vrancken, C.12
Maex, K.13
-
21
-
-
0345222451
-
-
21. A.S. Wang D.Z. Chi M. Loomans D. Ma M.Y. Lai W.C. Tjiu S.J. Chua 2002 Appl. Phys. Lett. 81 5138 10.1063/1.1533856 1:CAS:528:DC%2BD38XpvVaqsr4%3D A.S. Wang, D.Z. Chi, M. Loomans, D. Ma, M.Y. Lai, W.C. Tjiu, S.J. Chua, Appl. Phys. Lett. 81, 5138 (2002)
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 5138
-
-
Wang, A.S.1
Chi, D.Z.2
Loomans, M.3
Ma, D.4
Lai, M.Y.5
Tjiu, W.C.6
Chua, S.J.7
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