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Volumn 24, Issue 1, 2014, Pages

Isotropic etching technique for three-dimensional microball-bearing raceways

Author keywords

[No Author keywords available]

Indexed keywords

BEARING DYNAMICS; ETCHING NON-UNIFORMITY; HIGH-SPEED OPERATION; INDUCTIVELY-COUPLED; ISOTROPIC ETCHING; MICRO TURBINE; PLASMA ETCHING TECHNIQUE; RACEWAY DEPTH;

EID: 84891110156     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/24/1/015021     Document Type: Article
Times cited : (9)

References (27)
  • 1
    • 70350645339 scopus 로고    scopus 로고
    • A rotary microactuator supported on encapsulated microball bearings using an electro-pneumatic thrust balance
    • 10.1088/0960-1317/19/9/094007 0960-1317 094007
    • McCarthy M, Waits C M, Beyaz M I and Ghodssi R 2009 A rotary microactuator supported on encapsulated microball bearings using an electro-pneumatic thrust balance J. Micromech. Microeng. 19 094007
    • (2009) J. Micromech. Microeng. , vol.19 , Issue.9
    • McCarthy, M.1    Waits, C.M.2    Beyaz, M.I.3    Ghodssi, R.4
  • 2
    • 67349098835 scopus 로고    scopus 로고
    • Dynamic friction and wear in a planar-contact encapsulated microball bearing using an integrated microturbine
    • 10.1109/JMEMS.2009.2013407
    • McCarthy M, Waits C M and Ghodssi R 2009 Dynamic friction and wear in a planar-contact encapsulated microball bearing using an integrated microturbine J. Microelectromech. Syst. 18 263-73
    • (2009) J. Microelectromech. Syst. , vol.18 , pp. 263-273
    • McCarthy, M.1    Waits, C.M.2    Ghodssi, R.3
  • 3
    • 76349098212 scopus 로고    scopus 로고
    • A microfabricated spiral-groove turbopump supported on microball bearings
    • 10.1109/JMEMS.2009.2035525 1057-7157
    • Waits C M, McCarthy M and Ghodssi R 2010 A microfabricated spiral-groove turbopump supported on microball bearings J. Microelectromech. Syst. 19 99-109
    • (2010) J. Microelectromech. Syst. , vol.19 , pp. 99-109
    • Waits, C.M.1    McCarthy, M.2    Ghodssi, R.3
  • 6
    • 17144406379 scopus 로고    scopus 로고
    • Microfabrication of 3D silicon MEMS structures using gray-scale lithography and deep reactive ion etching
    • DOI 10.1016/j.sna.2004.03.024, PII S0924424704001931
    • Waits C M, Morgan B, Kastantin M and Ghodssi R 2005 Microfabrication of 3D silicon MEMS structures using gray-scale lithography and deep reactive ion etching Sensors Actuators a 119 245-53 (Pubitemid 40519337)
    • (2005) Sensors and Actuators, A: Physical , vol.119 , Issue.1 , pp. 245-253
    • Waits, C.M.1    Morgan, B.2    Kastantin, M.3    Ghodssi, R.4
  • 7
    • 33947211839 scopus 로고    scopus 로고
    • Automated two-axes optical fiber alignment using grayscale technology
    • DOI 10.1109/JMEMS.2006.886035
    • Morgan B, McGee J and Ghodssi R 2007 Automated two-axes optical fiber alignment using grayscale technology J. Microelectromech. Syst. 16 102-10 (Pubitemid 46431410)
    • (2007) Journal of Microelectromechanical Systems , vol.16 , Issue.1 , pp. 102-110
    • Morgan, B.1    McGee, J.2    Ghodssi, R.3
  • 8
    • 0033537535 scopus 로고    scopus 로고
    • 3D microfabrication by combining microstereolithography and thick resist UV lithography
    • 10.1016/S0924-4247(98)00249-0 0924-4247 A
    • Bertsch A, Lorenz H and Renaud P 1999 3D microfabrication by combining microstereolithography and thick resist UV lithography Sensors Actuators A 73 14-23
    • (1999) Sensors Actuators , vol.73 , pp. 14-23
    • Bertsch, A.1    Lorenz, H.2    Renaud, P.3
  • 9
    • 84856235496 scopus 로고    scopus 로고
    • Functional flexible organic-inorganic hybrid polymer for two photon patterning of optical waveguides
    • 10.1016/j.optmat.2011.11.007
    • Bichler S et al 2012 Functional flexible organic-inorganic hybrid polymer for two photon patterning of optical waveguides Opt. Mater. 34 772-80
    • (2012) Opt. Mater. , vol.34 , pp. 772-780
    • Bichler, S.1
  • 10
    • 0030107346 scopus 로고    scopus 로고
    • Three-dimensional microfabrication by localized electrochemical deposition
    • PII S1057715796014643
    • Madden J D and Hunter I W 1996 Three-dimensional microfabrication by localized electrochemical deposition J. Microelectromech. Syst. 5 24-32 (Pubitemid 126582172)
    • (1996) Journal of Microelectromechanical Systems , vol.5 , Issue.1 , pp. 24-32
    • Madden, J.D.1    Hunter, I.W.2
  • 11
    • 2342636455 scopus 로고    scopus 로고
    • Recent developments in micromilling using focused ion beam technology
    • 10.1088/0960-1317/14/4/R01 0960-1317 R01
    • Tseng A A 2004 Recent developments in micromilling using focused ion beam technology J. Micromech. Microeng. 14 R15-34
    • (2004) J. Micromech. Microeng. , vol.14 , Issue.4
    • Tseng, A.A.1
  • 12
    • 84975367006 scopus 로고
    • Chemical etching of silicon: 2. The system HF, HNO3, H2O, and HC2H3O2
    • 10.1149/1.2427617 0013-4651
    • Robbins H and Schwartz B 1960 Chemical etching of silicon: 2. The system HF, HNO3, H2O, and HC2H3O2 J. Electrochem. Soc. 107 108-11
    • (1960) J. Electrochem. Soc. , vol.107 , pp. 108-111
    • Robbins, H.1    Schwartz, B.2
  • 13
    • 0017266754 scopus 로고
    • Chemical etching of silicon: 4. Etching technology
    • 10.1149/1.2132721 0013-4651
    • Schwartz B and Robbins H 1976 Chemical etching of silicon: 4. Etching technology J. Electrochem. Soc. 123 1903-9
    • (1976) J. Electrochem. Soc. , vol.123 , pp. 1903-1909
    • Schwartz, B.1    Robbins, H.2
  • 14
    • 0037273430 scopus 로고    scopus 로고
    • Monte Carlo simulation method for etching of deep trenches in Si by a SF6/O2 plasma mixture
    • 10.1116/1.1521959 0734-2101 A
    • Marcos G, Rhallabi A and Ranson P 2003 Monte Carlo simulation method for etching of deep trenches in Si by a SF6/O2 plasma mixture J. Vac. Sci. Technol. A 21 87-95
    • (2003) J. Vac. Sci. Technol. , vol.21 , pp. 87-95
    • Marcos, G.1    Rhallabi, A.2    Ranson, P.3
  • 15
    • 79960067075 scopus 로고    scopus 로고
    • Three-dimensional etching of silicon substrates using a modified deep reactive ion etching technique
    • 10.1088/0960-1317/21/7/074005 0960-1317 074005
    • Azimi S, Sandoughsaz A, Amirsolaimani B, Naghsh-Nilchi J and Mohajerzadeh S 2011 Three-dimensional etching of silicon substrates using a modified deep reactive ion etching technique J. Micromech. Microeng. 21 074005
    • (2011) J. Micromech. Microeng. , vol.21 , Issue.7
    • Azimi, S.1    Sandoughsaz, A.2    Amirsolaimani, B.3    Naghsh-Nilchi, J.4    Mohajerzadeh, S.5
  • 16
    • 42549119820 scopus 로고    scopus 로고
    • Development of a comprehensive model for RIE-lag-based three-dimensional microchannel fabrication
    • DOI 10.1088/0960-1317/18/2/025003, PII S096013170861445X
    • Gantz K, Renaghan L and Agah M 2008 Development of a comprehensive model for RIE-lag-based three-dimensional microchannel fabrication J. Micromech. Microeng. 18 025003 (Pubitemid 351591248)
    • (2008) Journal of Micromechanics and Microengineering , vol.18 , Issue.2 , pp. 025003
    • Gantz, K.1    Renaghan, L.2    Agah, M.3
  • 17
    • 17444372774 scopus 로고    scopus 로고
    • Investigations of the isotropic etch of an ICP source for silicon microlens mold fabrication
    • DOI 10.1088/0960-1317/15/4/028
    • Larsen K P, Ravnkilde J T and Hansen O 2005 Investigations of the isotropic etch of an ICP source for silicon microlens mold fabrication J. Micromech. Microeng. 15 873-82 (Pubitemid 40541017)
    • (2005) Journal of Micromechanics and Microengineering , vol.15 , Issue.4 , pp. 873-882
    • Larsen, K.P.1    Ravnkilde, J.T.2    Hansen, O.3
  • 20
    • 50049095023 scopus 로고    scopus 로고
    • Encapsulated ball bearings for rotary micro machines
    • 10.1088/0960-1317/17/9/S03 0960-1317 S03
    • Waits C M, Geil B and Ghodssi R 2007 Encapsulated ball bearings for rotary micro machines J. Micromech. Microeng. 17 S224-9
    • (2007) J. Micromech. Microeng. , vol.17 , Issue.9
    • Waits, C.M.1    Geil, B.2    Ghodssi, R.3
  • 23
    • 77950688880 scopus 로고    scopus 로고
    • Simulations of Si and SiO(2) etching in SF(6)+O(2) plasma
    • 0587-4246 A
    • Knizikevicius R 2010 Simulations of Si and SiO(2) etching in SF(6)+O(2) plasma Acta Phys. Pol. A 117 478-83
    • (2010) Acta Phys. Pol. , vol.117 , pp. 478-483
    • Knizikevicius, R.1
  • 26
    • 84891105778 scopus 로고    scopus 로고
    • Analysis of DRIE uniformity for microelectromechanical systems
    • Hill T 2004 Analysis of DRIE uniformity for microelectromechanical systems Masters of Science, Electrical and Computer Science (Cambridge, MA: Massachusetts Institute of Technology)
    • (2004) Masters of Science, Electrical and Computer Science
    • Hill, T.1
  • 27
    • 38349157268 scopus 로고    scopus 로고
    • Macro- to Nanoscale wear prevention via molecular adsorption
    • 10.1021/la702598g
    • Asay D B, Dugger M T, Ohlhausen J A and Kim S H 2007 Macro- to Nanoscale wear prevention via molecular adsorption Langmuir 24 155-9
    • (2007) Langmuir , vol.24 , pp. 155-159
    • Asay, D.B.1    Dugger, M.T.2    Ohlhausen, J.A.3    Kim, S.H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.