Study of the roughness in a photoresist masked, isotropic, SF6 -based ICP silicon etch

Journal of the Electrochemical Society

Volumn 153, Issue 12, 2006, Pages

  Larsen, Kristian P ^a   Petersen, Dirch Hjorth ^a   Hansen, Ole ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTAL ORIENTATION; INDUCTIVELY COUPLED PLASMA; SILICON; SURFACE ROUGHNESS;

ETCHING PARAMETERS; ISOTROPIC ETCHING; THRESHOLD VALUE;

PHOTORESISTORS;

EID: 33750824737     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2357723     Document Type: Article

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