Interface-mediated photostimulation effects on diffusion and activation of boron implanted into silicon

ECS Journal of Solid State Science and Technology

Volumn 2, Issue 5, 2013, Pages

  Kondratenko, Yevgeniy ^a   Seebauer, Edmund G ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84889828638     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.018305jss     Document Type: Article

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