Pair diffusion and kick-out: Contributions to diffusion of boron in silicon

AIChE Journal

Volumn 50, Issue 12, 2004, Pages 3248-3256

  Jung, M Y L ^a   Gunawan, R ^a   Braatz, R D ^a   Seebauer, E G ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BORON; DIFFUSION; MAXIMUM LIKELIHOOD ESTIMATION; MICROELECTRONICS; MONTE CARLO METHODS; REACTION KINETICS;

MULTIVARIATE STATISTICS; PAIR DIFFUSION;

SILICON;

BORON; SILICON;

BORON; CHEMICAL ENGINEERING; DIFFUSION;

ARTICLE; DIFFUSION; ELECTRON SPIN RESONANCE; ENERGY; KINETICS; MONTE CARLO METHOD; PROBABILITY; STATISTICAL MODEL; THERMAL ANALYSIS;

EID: 10844237076     PISSN: 00011541     EISSN: None     Source Type: Journal    
DOI: 10.1002/aic.10220     Document Type: Article

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