Measurement of nonthermal illumination-enhanced self-diffusion in silicon

Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004

Volumn 4, Issue , 2004, Pages 87-89

  Jung, M Y L ^a   Seebauer, E G ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTRIC CHARGE; EPITAXIAL GROWTH; ION IMPLANTATION; ISOTOPES; RAPID THERMAL ANNEALING; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; THERMAL DIFFUSION; ULTRAVIOLET RADIATION;

ARSENIC DIFFUSION; LAMP ILLUMINATION; SHEET RESISTANCES; THERMAL MOTION;

SEMICONDUCTING SILICON;

EID: 3543144811     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Conference Paper

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