Sources of error in quantitative depth profiling of shallow doping distributions by secondary-ion-mass spectrometry in combination with oxygen flooding

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 272-279

  Wittmaack, K ^a   Corcoran, S F ^b  

^a INSTITUTE OF EPIDEMIOLOGY   (Germany)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BOMBARDMENT; OXIDATION; OXYGEN; SEMICONDUCTING BORON; SEMICONDUCTOR DOPING; SILICON WAFERS; SPUTTERING; THICKNESS MEASUREMENT;

BORON TO SILICON SENSITIVITY RATIO; IMPURITY TO MATRIX SENSITIVITY RATIO; QUANTITATIVE DEPTH PROFILING; SURFACE PROFILOMETER;

SECONDARY ION MASS SPECTROMETRY;

EID: 11644279001     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589794     Document Type: Article

References (42)

1. K. Wittmaack, Surf. Interface Anal. 24, 389 (1996).
2. K. Wittmaack, Philos. Trans. R. Soc. London, Ser. A 354, 2731 (1996).
3. G. Slodzian and J.-F. Hennequin, C. R. Acad. Sci. (Paris), Ser. B 263, 1246 (1966).
4. J. Maul and K. Wittmaack, Surf. Sci. 47, 358 (1975).
5. K. Wittmaack, Surf. Sci. 68, 118 (1977).
6. C. W. Magee, W. L. Harrington, and R. E. Honig, Rev. Sci. Instrum. 49, 477 (1978).
7. W. Reuter and K. Wittmaack, Appl. Surf. Sci. 5, 221 (1980).
8. M. A. Frisch, W. Reuter, and K. Wittmaack, Rev. Sci. Instrum. 51, 695 (1980).
9. A. E. Morgan, H. A. M. de Grefte, N. Warmoltz, H. W. Werner, and H. J. Tolle, Appl. Surf. Sci. 7, 372 (1981).
10. W. Vandervorst and F. R. Shepherd, J. Vac. Sci. Technol. A 5, 313 (1987).
11. A. E. Morgan and P. Maillot, in Secondary Ion Mass Spectrometry SIMS VI, edited by A. Benninghoven, A. M. Huber, and H. W. Werner (Wiley, Chichester, 1988), p. 709.
12. J. L. Hunter, S. F. Corcoran, D. P. Griffis, and C. M. Osburn, J. Vac. Sci. Technol. A 8, 2323 (1990).
13. P. C. Zalm and C. J. Vriezema, Nucl. Instrum. Methods Phys. Res. B 64, 626 (1992).
14. S. F. Corcoran and S. B. Felch, J. Vac. Sci. Technol. B 10, 342 (1992).
15. B. G. Svensson, M. K. Linnarsson, B. Mohadjeri, M. Petravic', and J. S. Williams, Nucl. Instrum. Methods Phys. Res. B 85, 363 (1994).
16. M. Nakamura, K. Yamada, K. Okuno, F. Soeda, and A. Ishitani, in Secondary Ion Mass Spectrometry SIMS IX, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley, Chichester, 1994), p. 207.
17. K. Elst, W. Vandervorst, H. Bender, and J. Alay, in Ref. 16, p. 617.
18. T. Hoshi, K. Miyoshi, and M. Tomita, in Ref. 16, p. 710.
19. S. B. Felch, D. L. Chapek, S. M. Malik, P. Maillot, E. Ishida, and C. W. Magee, J. Vac. Sci. Technol. B 14, 336 (1996).
20. J. W. Erickson and R. Brigham, J. Vac. Sci. Technol. B 14, 353 (1996).
21. W. Vandervorst, F. R. Shepherd, J. Newman, B. F. Phillips, and J. Remmerie, J. Vac. Sci. Technol. A 3, 1359 (1985).
22. W. Wach and K. Wittmaack, J. Appl. Phys. 52, 3341 (1981).
23. G. Holmén and H. Jacobsson, Appl. Phys. Lett. 53, 1838 (1988).
24. A. Terrasi, J. Almeida, C. Coluzza, and G. Margaritondo, Nucl. Instrum. Methods Phys. Res. B 116, 416 (1996).
25. K. Wiltmaack and W. Wach, Nucl. Instrum. Methods 191, 327 (1981).
26. K. Wiltmaack and D. B. Poker, Nucl. Instrum. Methods Phys. Res. B 47, 224 (1990).
27. M. Meuris, P. De Bisschop, J. F. Leclair, and W. Vandervorst, Surf. Interface Anal. 14, 739 (1989).
28. K. Wittmaack (unpublished).
29. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985).
30. J. A. McHugh, in Methods and Phenomena, Vol. 1: Methods of Surface Analysis, edited by A. W. Czanderna (Elsevier, Amsterdam, 1975), p. 223.
31. J. D. Ganjei, D. P. Leta, and G. H. Morrison, Anal. Chem. 50, 285 (1978).
32. K. Wittmaack, Nucl. Instrum. Methods 168, 343 (1980).
33. G. Stingeder, Fresenius J. Anal. Chem. 327, 225 (1987).
34. F. A. Stevie, P. M. Kahora, D. S. Simons, and P. Chi, J. Vac. Sci. Technol. A 6, 76 (1988).
35. K. Wittmaack, J. Vac. Sci. Technol. A 8, 2246 (1990).
36. J. J. Vajo, R. E. Doty, and E.-H. Cirlin, J. Vac. Sci. Technol. A 14, 2709 (1996).
37. K. Elst, W. Vandervorst, J. Alay, J. Snauwaert, and L. Hellemans, J. Vac. Sci. Technol. B 11, 1968 (1993).
38. K. Wittmaack, in Secondary Ion Mass Spectrometry SIMS X, edited by A. Benninghoven, B. Hagenhoff, and H. W. Werner (Wiley, Chichester, 1997), p. 657.
39. W. Wach and K. Wittmaack, Nucl. Instrum. Methods 194, 113 (1982).
40. K. Wittmaack, Surf. Interface Anal. 21, 323 (1994).
41. N. S. Smith, M. G. Dowsett, B. McGregor, and P. Phillips, in Ref. 38, p. 363.
42. K. Wittmaack, Surf. Interface Anal. (unpublished).