An (un)solvable problem in SIMS: B-interfacial profiling

Applied Surface Science

Volumn 203-204, Issue , 2003, Pages 371-376

  Vandervorst, W ^a   Janssens, T ^a   Loo, R ^a   Caymax, M ^a   Peytier, I ^a   Lindsay, R ^a   Fruhauf J ^c   Bergmaier, A ^b   Dollinger, G ^b  

^a IMEC   (Belgium)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c NONE

Author keywords

Boron segregation; Depth resolution; ERDA; Oxygen bombardment; SIMS; Surface peak

Indexed keywords

ANNEALING; DOPING (ADDITIVES); SECONDARY ION MASS SPECTROMETRY; SEGREGATION (METALLOGRAPHY); SILICON; SPUTTERING;

LOW ENERGY IMPLANTATION;

BORON;

EID: 12244307199     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00678-5     Document Type: Conference Paper

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9. T.H. Buyuklimanli, C.W. Magee, Presented at SIMS-III, still in press.