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Volumn 3, Issue 9, 2013, Pages

Effect of grain-boundaries on electrical properties of n-ZnO:Al/p-Si heterojunction diodes

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; FILM THICKNESS; HETEROJUNCTIONS; II-VI SEMICONDUCTORS; OPTICAL FILMS; OXIDE MINERALS; SEMICONDUCTOR DIODES; ZINC OXIDE;

EID: 84885649599     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.4823480     Document Type: Article
Times cited : (42)

References (28)
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    • Pei, Z.L.1    Zhang, X.B.2    Zhang, G.P.3    Gong, J.4    Sun, C.5    Huang, R.F.6    Wen, L.S.7
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    • Ziabari, A.A.1    Rozati, S.M.2
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    • Characterization of n-ZnO/p-Si films grown by magnetron sputtering
    • DOI 10.1016/j.spmi.2005.08.070, PII S0749603605001394, E-MRS 2005 Symposium G: ZnO and Related Materials Part 2
    • F. Chaabouni, M. Abaab, and B. Rezig, Superlattices and Microstructures 39, 171-178 (2006). 10.1016/j.spmi.2005.08.070 (Pubitemid 43005133)
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    • Chaabouni, F.1    Abaab, M.2    Rezig, B.3
  • 28
    • 44449125818 scopus 로고    scopus 로고
    • P-ZnO/n-Si heterojunction: Sol-gel fabrication, photoresponse properties, and transport mechanism
    • DOI 10.1063/1.2937124
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.